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Si/Ge Strained-Layer Epitaxy: Sil−xGex Alloy Buffer Layers and Ultra-Short Period SimGen Superlattices.

Published online by Cambridge University Press:  28 February 2011

M. Ospelt ,
J. Henz ,
E. MÜller  and
H. Von KÄnel
M. Ospelt
Affiliation:
Laboratorium für Festkörperphysik, ETH-Hönggerberg, CH-8093 Zürich, Switzerland
J. Henz
Affiliation:
Laboratorium für Festkörperphysik, ETH-Hönggerberg, CH-8093 Zürich, Switzerland
E. MÜller
Affiliation:
Laboratorium für Festkörperphysik, ETH-Hönggerberg, CH-8093 Zürich, Switzerland
H. Von KÄnel
Affiliation:
Laboratorium für Festkörperphysik, ETH-Hönggerberg, CH-8093 Zürich, Switzerland
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Abstract

Sil−xGex alloy layers and ultra-short period SimGen superlattices on alloy buffer layers of the same concentration have been grown by MBE. The superlattices as a whole have been shown to have the lattice constant of the underlying alloy buffer layer, the individual Si and Ge layers being fully strained. Samples with a graded Ge content have been used to study the relaxation as a function of Ge content by means of X-ray diffraction and RBS and channeling.

Transmission electron spectroscopy reveals that interface roughness is not simply statistical in these superlattices. Rather, electron diffraction shows additional features from a period doubling in the (111) directions, indicating that a corresponding interfacial ordering occurs. These features show 2- or 3-dimensional behavior depending on the thickness of the Si and Ge layers in the superlattices. Annealing studies show these features to persist even for annealing temperatures where the superlattices disintegrate into alloys.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 198: Symposium V – Epitaxial Heterostructures , 1990 , 485
Copyright
Copyright © Materials Research Society 1990

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References

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