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Selective Etching of SnO2:F Films with a Pulse Programmable Industrial Fiber Laser
Published online by Cambridge University Press: 24 June 2013
Abstract
In our work on laser scribing CdTe solar cells we have found what appears to be an unpublished laser material interaction that allows precise laser etching of SnO2 films to an arbitrary thickness with high uniformity. This precise and efficient laser etching mechanism allows arbitrary reduction of the film thickness in a controlled manner on the scale of tens of nm. In addition to the fine depth selection, we find that there develops a pulse duration dependent microstructure on the surface. This micro microstructure results in a strong diffraction effect in the visible portion of the spectrum. In this work we propose a physical mechanism behind this novel depth selective laser interaction as well as the resultant micro-structure. Finally we demonstrate and propose some possible applications for this process.
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- Information
- MRS Online Proceedings Library (OPL) , Volume 1494: Symposium F – Oxide Semiconductors and Thin Films , 2013 , pp. 277 - 290
- Copyright
- Copyright © Materials Research Society 2013
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