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Rf Hollow Cathode Plasma Jet Depopsition of BaxSR1-XTI03 Films

Published online by Cambridge University Press:  01 February 2011

N.J. Ianno
Affiliation:
Department of Electrical Engineering, 209N WSEC, University of Nebraska-Lincoln, NE 68588, USA
R.J. Soukup
Affiliation:
Department of Electrical Engineering, 209N WSEC, University of Nebraska-Lincoln, NE 68588, USA
Z. Hubička
Affiliation:
Institute of Physics ASCR, Na Slovance 2 182 21 Prague 8 Czech Republic
J. Olejnčcek
Affiliation:
Institute of Physics ASCR, Na Slovance 2 182 21 Prague 8 Czech Republic
H. Ŝíchová
Affiliation:
Institute of Physics ASCR, Na Slovance 2 182 21 Prague 8 Czech Republic
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Abstract

An initial study of the RF hollow cathode plasma jet deposition of BaxSr1-xTiO3 has been performed. Deposition occurred from a single composite nozzle consisting of BaTiO3 and SrTiO3 at substrate temperatures on the 500-550 C range. It has been shown that film composition can be easily controlled by the nozzle composition as well as other deposition parameters. The as-deposited films exhibit clear BSTO peaks with grain size on the order of 30nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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