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Relationships between Film Chemistry, Structure, and Mechanical Properties in Titanium Oxide

Published online by Cambridge University Press:  21 March 2011

M. Pang
Affiliation:
Mechanical and Materials Engineering, Washington State University, Pullman WA 99164-2920
D.E. Eakins
Affiliation:
Mechanical and Materials Engineering, Washington State University, Pullman WA 99164-2920
M.G. Norton
Affiliation:
Mechanical and Materials Engineering, Washington State University, Pullman WA 99164-2920
D.F. Bahr
Affiliation:
Mechanical and Materials Engineering, Washington State University, Pullman WA 99164-2920
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Abstract

Titanium oxides were grown anodically to selected final potentials on grade II polycrystalline titanium under different anodization rates. XPS and RBS results show that the oxide consists of primarily TiO2with a non-stoichiometric oxide/metal interface, with the slower growth rate associated with a thicker layer at the interface. Characterization using TEM reveals that the structure of the oxide evolves from a primarily amorphous phase to islands of crystallites in an amorphous matrix, to an entirely crystalline phase by increasing the polarization potential. Slower growth rates tend to remain crystalline at higher potentials. The mechanical strength of oxide films extracted from load-depth data by nanoindentation varies dramatically for oxide films grown by different rates at 9.4 V, and to a lesser extent at lower potentials. The variation of film strength is associated with both compositional and structural characteristics.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

1. Bahr, D. F., Kramer, D. E., and Gerberich, W. W., Acta Mater., 46(10), 3605 (1998).Google Scholar
2. Chechenin, N. G., Bottiger, J., and Krog, J. P., Thin Solid Films, 261, 228 (1995).Google Scholar
3. Ramsey, P. M., Chandler, H. W., and Page, T. F., Surf. Coat. Technol., 49, 504 (1991).Google Scholar
4. Gerberich, W. W., Strojny, A., Yoder, K., and L-S, Cheng, J. Mater. Res., 14(6), 2210 (1999).Google Scholar
5. Arsov, Lj. A., Kormann, C., and Plieth, V., J. Electrochem. Soc. 138 (10), 2964 (1991).Google Scholar
6. Wiesler, D.G., Toney, M. F., Samant, M. G., Melroy, O. R., McMillan, C. S., and Smyrl, W. H., Surf. Sci. 268, 57 (1992).Google Scholar
7. Kozlowski, M. R., Tyler, P. S., Smyrl, W. H., and Atanasoski, R. T., Surf. Sci, 194, 505 (1988).Google Scholar
8. Lawless, K. R., Rep. Prog. Phys., 37, 231 (1974).Google Scholar
9. Pang, M., Eakins, D.P., Norton, M.G., and Bahr, D.F., Corrosion, in press ( June 2001).Google Scholar
10. Ohtsuka, T., Mauda, M., and Sato, N., J. Electrochem. Soc. 132 (4), 787 (1985).Google Scholar