Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by Crossref.
Guo, Xin
Zhao, J.
Qiao, J.
Tabata, A.
Pang, B.
Galiano, M.
and
Sinha, A.
1994.
Studies of Pecvd and Ozone CVD Deposition Rate, Uniformity and Step Coverage.
MRS Proceedings,
Vol. 363,
Issue. ,
Layeillon, L
Duverneuil, P
Couderc, J P
and
Despax, B
1994.
Analysis and modelling of plasma enhanced CVD reactors. I. Two-dimensional treatment of a-Si:H deposition.
Plasma Sources Science and Technology,
Vol. 3,
Issue. 1,
p.
61.
Layeillon, L.
Dollet, A.
and
Despax, B.
1995.
Plasma enhanced deposition of a-Si-H: comparison of two reactor arrangements.
The Chemical Engineering Journal and the Biochemical Engineering Journal,
Vol. 58,
Issue. 1,
p.
1.
Perrin, Jérôme
1995.
Plasma Deposition of Amorphous Silicon-Based Materials.
p.
177.