Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-28T08:57:10.093Z Has data issue: false hasContentIssue false
  • English
  • Français

Production of III-V Nanocrystals by Picosecond Pulsed Laser Ablation

Published online by Cambridge University Press:  15 February 2011

M. H. Wu ,
R. Mu ,
A. Ueda  and
D. O. Henderson
A. Ueda
Affiliation:
Department of Physics, Fisk University Nashville, TN 37208
D. O. Henderson
Affiliation:
Department of Physics, Fisk University Nashville, TN 37208
Get access

Abstract

In As nanoparticles have been produced by picosecond pulsed laser ablation of bulk targets in the presence of an inert backing gas. Atomic force microscopy measurements show particles ranging in size from one to ten nm. Stoichiometry of the targets, determined by Rutherford backscattering measurements, are typically preserved within ten percent. Optical absorption and raman scattering data help confirm the crystalline, quantum confined nature of the nanoparticles.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 780: Symposium Y – Advanced Optical Processing of Materials , 2003 , Y3.2
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

references

1. Muramoto, J., Inmaruy, T, Nakata, Y., Okada, T. and Maeda, M., Appl. Phys. A69, 8239 (1999).Google Scholar
2. Patrone, L., Nelson, D., Safarov, V. I., Giorgio, S., Sentis, M. and Marine, W., Appl. Phys. A 69, 8217 (1999).Google Scholar
3.See, for example, Movtchan, L. A., Marine, W., Dreyfus, R. W., Le, H. C., Sentis, M. and Autric, M., Appl. Surf. Sci. 96-98, 251 (1996).Google Scholar
4. Dinh, L. N., Hayes, S. E., Wynne, A. E., Wall, M. A., Saw, C. K., Stuart, B. C., Balooch, M., Paravatsu, A. K. and Reimer, J. A., J. Mat. Sci. 37, 3953 (2002).Google Scholar
5. Wu, M. H., Mu, R., Ueda, A. and Henderson, D. O., Mat. Res. Soc. Symp. Proc. 638, F13.2.1 (2001).Google Scholar
6.“Handbook Series on Semiconductor Parameters” vol. 1, 2 edited by Levinstein, M., Rumyantsev, S. and Shur, M., World Scientific, London, 1996.Google Scholar
7. Abeles, B., Beers, D.S., Cody, G. D. and Dismukes, J. P., Phys. Rev. 125, 44 (1962).Google Scholar
8. Heitz, R., Born, H., Hoffmann, A., Bimberg, D., Mukhametzhanov, I. and Madhukar, A., Appl. Phys. 77, 3746 (2000).Google Scholar