Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-28T13:52:08.563Z Has data issue: false hasContentIssue false
  • English
  • Français

Processing of yttria stabilized zirconia thin films by liquid fuel combustion chemical vapor deposition

Published online by Cambridge University Press:  21 March 2011

Zhigang Xu ,
Q. Wei  and
Jag Sankar
Zhigang Xu
Affiliation:
NSF Center For Advanced Materials And Smart Structures, North Carolina A&T University, Greensboro, NC 27411
Q. Wei
Affiliation:
NSF Center For Advanced Materials And Smart Structures, North Carolina A&T University, Greensboro, NC 27411 Department of Mechanical Engineering, The Johns Hopkins University, Baltimore, MD 21218
Jag Sankar
Affiliation:
NSF Center For Advanced Materials And Smart Structures, North Carolina A&T University, Greensboro, NC 27411
Get access

Abstract

Yttria fully stabilized zirconia (YSZ) thin films have been successfully synthesized with atmospheric combustion chemical vapor deposition (ACCVD) technique with liquid fuel. Key processing parameters, such as the ratio of oxygen to liquid fuel in the flame, the concentration of metal reagents in the solution, the temperature of the substrate and substrate material, have been investigated. The as-grown films are characterized with X-ray diffraction and scanning electron microscopy. Within the range of experimental parameters, the phase of the film is predominantly of cubic structure. The phase and crystallinity of the films are strongly dependent upon the experimental variables.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 672: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures , 2001 , O8.29
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Singhal, S.C., MRS Bulletin, 25 (3), 22(2000)Google Scholar
2. Carolan, M.F. and Michaels, J.N., Solid State Ionics, 25, 207(1987)Google Scholar
3. Han, J., Zeng, Y., Xomeritakis, G. and Y. S. Lin,, Solid State Ionics, 98, 63(1997)Google Scholar
4. Lin, Y.S. et al, J. Electrochem. Soc., 137, 3960(1990)Google Scholar
5. Swider, K.E., Worrell, W.L., J. Mater. Res., 11(2), 381(1996)Google Scholar
6. Chour, K.-W., Chen, J. and Xu, R., Thin Solid Films, 304, 106(1997)Google Scholar
7. Dubourdieu, C., Kang, S.B., Li, Y.Q., Gulesha, G. and Gallois, B., Thin Solid Films, 339, 165(1999)Google Scholar
8. Garcia, G., Casado, J., Llibre, J. and Figueras, A., J. Crystal Growth, 147, 130(1995)Google Scholar
9. Cater, W.B.et al. Thin Solid Films, 347, 25(1999)Google Scholar
10. Carer, W.B., 1999, In Intermetallic And Ceramic Coatings, ed. Dahotre, N.B., Sudarshan, T.S., Chap. 6, New York: Marcel Dekker, Inc. Google Scholar
11. Hampikian, J.M., Carter, W.B., Materials Science & Engineering A, 267,7(1999)Google Scholar
12. Hwang, S.-C. and Shin, H.-S., J. Am. Ceram. Soc., 82(10), 2913(1995)Google Scholar