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Published online by Cambridge University Press: 16 February 2011
We have modified a conventional dimpling machine to perform chemical polishing with a reactive etchant. The modified dimpler also detects specimen perforation in situ optically, and automatically stops the dimpling process by lifting the dimpler wheel and flooding the specimen with a rinse solution. Using this apparatus, we are able to prepare both planar and cross-sectional thin specimens of compound semiconductor materials without using expensive and time-consuming ion-milling. The specimens have large thin areas, are free of artifacts, and are suitable for high-resolution lattice imaging.