Porous methylsiloxane gel thick film for millimeter-wave antenna substrate prepared by gap filling method

Takeharu Tanaka; Nobuyuki Kawakami; Takayuki Hirano; Yoshito Fukumoto; Tetsuo Suzuki; Kazuyoshi Kanamori; Kazuki Nakanishi

doi:10.1557/PROC-0888-V09-17

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Porous methylsiloxane gel thick film for millimeter-wave antenna substrate prepared by gap filling method

Volume 888
Takeharu Tanaka ^(a1), Nobuyuki Kawakami ^(a2), Takayuki Hirano ^(a3), Yoshito Fukumoto ^(a4), Tetsuo Suzuki ^(a5), Kazuyoshi Kanamori ^(a6) and Kazuki Nakanishi ^(a7)
DOI: https://doi.org/10.1557/PROC-0888-V09-17

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Porous methylsiloxane gel thick film for millimeter-wave antenna substrate prepared by gap filling method

Volume 888
Takeharu Tanaka ^(a1), Nobuyuki Kawakami ^(a2), Takayuki Hirano ^(a3), Yoshito Fukumoto ^(a4), Tetsuo Suzuki ^(a5), Kazuyoshi Kanamori ^(a6) and Kazuki Nakanishi ^(a7)
DOI: https://doi.org/10.1557/PROC-0888-V09-17

To save this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Google Drive account. Find out more about saving content to Google Drive.

Porous methylsiloxane gel thick film for millimeter-wave antenna substrate prepared by gap filling method

Volume 888
Takeharu Tanaka ^(a1), Nobuyuki Kawakami ^(a2), Takayuki Hirano ^(a3), Yoshito Fukumoto ^(a4), Tetsuo Suzuki ^(a5), Kazuyoshi Kanamori ^(a6) and Kazuki Nakanishi ^(a7)
DOI: https://doi.org/10.1557/PROC-0888-V09-17

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