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Porous methylsiloxane gel thick film for millimeter-wave antenna substrate prepared by gap filling method

Published online by Cambridge University Press:  01 February 2011

Takeharu Tanaka ,
Nobuyuki Kawakami ,
Takayuki Hirano ,
Yoshito Fukumoto ,
Tetsuo Suzuki ,
Kazuyoshi Kanamori  and
Kazuki Nakanishi
Takeharu Tanaka
Affiliation:
[email protected], KOBE STEEL., LTD., Mechanical Engineering Research Laboratory, 1-5-5, Takatsukadai, Nishi-ku, Kobe, Hyogo, 6512271, Japan, +81-78-992-5732, +81-78-993-5547
Nobuyuki Kawakami
Affiliation:
[email protected], KOBE STEEL., LTD., Electronics Research Laboratory, Japan
Takayuki Hirano
Affiliation:
[email protected], KOBE STEEL., LTD., Electronics Research Laboratory, Japan
Yoshito Fukumoto
Affiliation:
[email protected], KOBE STEEL., LTD., Production Systems Research Laboratory, Japan
Tetsuo Suzuki
Affiliation:
[email protected], KOBE STEEL., LTD., Mechanical Engineering Research Laboratory, Japan
Kazuyoshi Kanamori
Affiliation:
[email protected], Kyoto University, Department of Chemistry, Graduate School of Science, Japan
Kazuki Nakanishi
Affiliation:
[email protected], Kyoto University, Department of Chemistry, Graduate School of Science, Japan
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Abstract

A novel process to fabricate a thick silica gel film on an aluminum substrate, named the “gap filling method”, has been developed. The process is based on a sol-gel method accompanied by phase separation in a submillimeter thick space defined by two facing substrates. Dielectric thick film integrated on a metal ground plate is successfully formed by using a SiO2 coated aluminum substrate and a cap plate covered with an amorphous carbon thin film, which control the hydrophilicity and the hydrophobicity of the plates, respectively. A thin continuous layer of less than 0.5 μm thick is formed at the interface between the porous film and the cap plate, which gives the film a smooth surface preferable for patterning metal circuits of an antenna. The observed dielectric constants (εr) at 60 GHz measured by the Fabry-Perot resonator method are in the range between 1.4 and 1.6. Methyl groups homogeneously distributed in the siloxane network give a hydrophobic siloxane gel film, thus the obtained films have enough environmental stability. These results show that the gap filling method is applicable to the preparation of the porous thick film that is needed for antenna applications.

Keywords

sol-geldielectric propertiesfilm
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 888: Symposium V – Materials and Devices for Smart Systems II , 2005 , 0888-V09-17
Copyright
Copyright © Materials Research Society 2006

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References

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