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Polycrystalline Diamond Films for X-Ray Lithography

Published online by Cambridge University Press:  15 February 2011

S. J. Whitehair ,
J. E. Yehoda ,
R. Fuentes ,
R. A. Roy ,
C. R. Guarnieri  and
J. J. Cuomo
S. J. Whitehair
Affiliation:
IBM, T.J. Watson Research Center, Yorktown Heights, NY 10598
J. E. Yehoda
Affiliation:
Diamonex Inc., 7150 Windsor Drive, Allentown, PA 18106
R. Fuentes
Affiliation:
Materials and Technologies Corp., 341 Sheafe Rd., Poughkeepsie, NY 12601
R. A. Roy
Affiliation:
IBM, T.J. Watson Research Center, Yorktown Heights, NY 10598
C. R. Guarnieri
Affiliation:
IBM, T.J. Watson Research Center, Yorktown Heights, NY 10598
J. J. Cuomo
Affiliation:
IBM, T.J. Watson Research Center, Yorktown Heights, NY 10598
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Abstract

Microwave driven discharges are finding increasing use in semiconductor areas such as deposition, etching, cleaning and ashing. One application that is of particular interest is the use of microwave discharge grown thin film diamond as a x-ray mask. Because of diamonds extreme properties these masks offer potential advantages over current silicon based mask technology. A review of diamond mask technology will be presented and compared to competing technologies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 97
Copyright
Copyright © Materials Research Society 1993

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