No CrossRef data available.
Published online by Cambridge University Press: 15 February 2011
We present a study of laser pulse induced crystallization and amorphizationin SbxSc1−x films. The time required to reach stableamorphous state after the pulse increases with exciting pulse length andbecomes constant when stationary temperature field is approached by the endof the pulse. The time dependence of the excited spot's local temperature isdeduced directly from amorphization threshold intensity dependence on thepulse length and is used to calculate the cooling times after theamorphizing pulse. Two photocrystallization regimes are distinguisheddepending on whether the melting starts before or after the end ofcrystallization, the condition depending on crystallization tendency forgiven composition x. The occurrence of melting limits the maximum opticalcontrast during photocrystallization. The results show that thecrystallization tendency of SbxSei-x rises with x and has a local maximumbetween x = 0.5 and x = 0.7.