Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-28T09:16:29.034Z Has data issue: false hasContentIssue false

Optical and electrical study of cap layer effect in QHE devices with double-2DEG

Published online by Cambridge University Press:  19 November 2013

L. Zamora-Peredo*
Affiliation:
Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines # 455, Fracc. Costa Verde, C.P. 94292, Boca del Río, Veracruz, México.
I. Cortes-Mestizo
Affiliation:
Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines # 455, Fracc. Costa Verde, C.P. 94292, Boca del Río, Veracruz, México.
L. García-Gonzáez
Affiliation:
Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines # 455, Fracc. Costa Verde, C.P. 94292, Boca del Río, Veracruz, México.
J. Hernández-Torres
Affiliation:
Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines # 455, Fracc. Costa Verde, C.P. 94292, Boca del Río, Veracruz, México.
T. Hernandez-Quiroz
Affiliation:
Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines # 455, Fracc. Costa Verde, C.P. 94292, Boca del Río, Veracruz, México.
M. Peres-Caro
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
M. Ramirez-López
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
I. Martinez-Veliz
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
Y. L. Casallas-Moreno
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
S. Gallardo-Hernández
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
A. Conde-Gallardo
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
M. López-López
Affiliation:
Departamento de Física, Centro de Investigaciones y de Estudios Avanzados - IPN, México D. F., México
Get access

Abstract

In this work we report on the characteristics of GaAs/AlGaAs heterostructures with a symmetric double two-dimensional electron gas (D-2DEG). Optical characterization was made by room temperature photoreflectance (PR) spectroscopy as well as electrical properties were determinated using the quantum Hall effect measurements at 2K. In order to study the surface effects on the conduction band profile, three samples with different GaAs cap layer thickness (25, 60 and 80 nm) were grown by the molecular beam epitaxy. Photoreflectance spectra at room temperature show the wide-period Franz-Keldysh oscillations between 1.42 and 1.70 eV originated by the surface electric field. The analysis of these oscillations shows that the surface electric field varies from 503 to 120 kV/cm whereas the thickness of the cap layer increases that was produced by the reduction of the depletion zone near the surface. Using QHE measurements we found that electron density increases if the surface electric field decreases.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Klitzing, Von, Dorda, G., and Pepper, M., Phys. Rev. Lett. 45 (1980) 494.CrossRefGoogle Scholar
Delahaye, and Jeckelmann, B., Metrologia 40 (2003) 217.CrossRefGoogle Scholar
Poirier, W., Bounouh, A., Hayashi, K., Fhirna, H., Piquemal, F., Genevès, G. and André, J. P., J. Appl. Phys. 92 (2002) 2844.CrossRefGoogle Scholar
Poirier, W., Bounouh, A., Piquemal, F., and André, J. P., Metrologia 41 (2004) 285 CrossRefGoogle Scholar
Bounouh, , Poirier, W., Piquemal, F., Genevès, G., and André, J. P., IEEE Trans. Instrum. Meas. 52 (2003) 555.CrossRefGoogle Scholar
Pierz, K., Hein, G., Pesel, E., Schumacher, B., Schumacher, H. W., and Siegner, U., Appl. Phys. Lett. 92 (2008) 133509.CrossRefGoogle Scholar
Pierz, K, Hein, G, Schumacher, B, Pesel, E and WSchumacher, H, Semicond. Sci. Technol. 25 (2010) 035014.CrossRefGoogle Scholar
Misiewicz, J., Sitarek, P., Sek, G., Opto-electronics review 8(1), 124 (2000).Google Scholar
Shen, H. and Pollak, F. H., Phys. Rev. B 42, (1990) 7097.Google Scholar
Jayant Baliga, B., Fundamentals of Power Semiconductor Devices, Springer, USA, 2008, pp. 306.CrossRefGoogle Scholar