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Nucleation and Growth Processes During the Chemical Vapor Deposition of Diamond
Published online by Cambridge University Press: 15 February 2011
Abstract
In situ microbalance measurements of diamond growth rates are described. These results can be used to test proposed mechanisms for diamond growth and suggest mechanisms for sp2 impurity incorporation. The Thiele modulus is a simple criterion for growth uniformity and is used to compare hot-filament and combustion-assisted growth.
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- Copyright © Materials Research Society 1995
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