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Novel Concepts for Low-pressure, Low-temperature Nanodiamond Growth Using MW-linear Antenna Plasma Sources

Published online by Cambridge University Press:  31 January 2011

Jan Vlček
Affiliation:
[email protected], Institute of Chemical Technology, Department of Physics and Measurements, Prague, Czech Republic
František Fendrych
Affiliation:
[email protected], Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague, Czech Republic
Andrew Taylor
Affiliation:
[email protected], Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague, Czech Republic
Irena Kratochvílová
Affiliation:
[email protected], Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague, Czech Republic
Ladislav Fekete
Affiliation:
[email protected], Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague, Czech Republic
Miloš Nesládek
Affiliation:
[email protected], Hasselt University, Diepenbeek, Belgium
Michael Liehr
Affiliation:
[email protected], Leybold Optics Dresden GmbH, Dresden, Germany
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Abstract

Industrial applications of PE MWCVD diamond grown on large area substrates, 3D shapes, at low substrate temperatures and on standard engineering substrate materials require novel plasma concepts. Based on the pioneering work of the group at AIST in Japan, high-density coaxial delivery type of plasmas have been explored [1]. However, an important challenge is to obtain commercially interesting growth rates at very low substrate temperatures. In the presented work we introduce the concept of novel linear antenna sources, designed at Leybold Optics Dresden, using high-frequency pulsed MW discharge. We present data on high plasma densities in this type of discharge (> 10 E11 cm-3), accompanied by data from OES for CH4 – CO2 - H2 gas chemistry and the basic properties of the nano-crystalline diamond (NCD) films grown.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

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