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Micro-organic Light-emitting Devices Fabricated by Room-temperature Curing Nanoimprint Lithography Using Diamond Molds

Published online by Cambridge University Press:  10 January 2012

Ippei Ishikawa ,
Taisuke Okuno ,
Shuji Kiyohara ,
Yoshio Taguchi ,
Yoshinari Sugiyama ,
Yukiko Omata  and
Yuichi Kurashima
Ippei Ishikawa
Affiliation:
Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Shiroya, Maizuru, Kyoto 625-8511, Japan
Taisuke Okuno
Affiliation:
Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Shiroya, Maizuru, Kyoto 625-8511, Japan
Shuji Kiyohara
Affiliation:
Electric and Control System Engineering Course, Faculty of Advanced Engineering, Maizuru National College of Technology, 234 Shiroya, Maizuru, Kyoto 625-8511, Japan
Yoshio Taguchi
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yoshinari Sugiyama
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yukiko Omata
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yuichi Kurashima
Affiliation:
Department of Mechanical System Engineering, University of Yamanashi, 4-3-11 Takeda, Kofu, Yamanashi 400-8511, Japan
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Abstract

Organic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 μm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N’-Diphenyl-N,N’-di(m-tolyl)benzidine (TPD) [hole transport layer],Tris(8-quinolinolato)aluminum (Alq3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 μm-square-dot by RTC-NIL using diamond molds.

Keywords

diamondoptoelectronicmicroelectronics
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1395: Symposium N – Diamond Electronics and Biotechnology–Fundamentals to Applications V , 2012 , mrsf11-1395-n12-04
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

1. Tang, C. W. and VanSlyke, S. A., Appl. Phys. Lett. 51, 913–915 (1987).Google Scholar
2. Marksa, T. J, Veinot, J. G. C, Cui, J, Yan, H, Wang, A, Edleman, N. L, Ni, J, Huang, Q, Lee, P and Armstrong, N. R, Syn. Met. 127, 29–35 (2002).Google Scholar
3. Kiyohara, S, Fujiwara, M, Matubayashi, F and Mori, K, Jpn. J. Appl. Phys. 44, 3686–3690 (2005).Google Scholar
4. DeFranco, J. A., Schmidt, B. S., Lipson, M. and Malliaras, G. G., Org. Electron. 7, 22–28 (2006).Google Scholar
5. Kiyohara, S., Kashiwagi, T., Takikawa, H., Kurashima, Y., Taguchi, Y. and Sugiyama, Y., e-J. Surf. Sci. Nanotech. 7, 772–776 (2009).Google Scholar
6. Kiyohara, S., Fujiwara, M., Matsubayashi, F. and Mori, K., J. Mater. Sci. Mater. Electronics 17, 199–203 (2006).Google Scholar
7. Mu, Haichuan, Shen, Hui, Klotzkin, David, Solid State Commun. 48, 2085–2088 (2004).Google Scholar