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Low Threshold Field Emission From Nanocluster Carbon Films

Published online by Cambridge University Press:  10 February 2011

W.I. Milne ,
B.S. Satyanarayana  and
J. Robertson
W.I. Milne
Affiliation:
Dept of Engineering, Cambridge University, Cambridge. CB2 1PZ, UK. Tel. +1223 3327257, Fax +1223 766207, e-mail, [email protected]
B.S. Satyanarayana
Affiliation:
Dept of Engineering, Cambridge University, Cambridge. CB2 1PZ, UK. Tel. +1223 3327257, Fax +1223 766207, e-mail, [email protected]
J. Robertson
Affiliation:
Dept of Engineering, Cambridge University, Cambridge. CB2 1PZ, UK. Tel. +1223 3327257, Fax +1223 766207, e-mail, [email protected]
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Abstract

Carbon films with variable sp3/sp2 bonding ratio can be deposited on a variety of substrates at room temperature, using the cathodic vacuum arc deposition process. The variation in their surface morphology as a function of He and N2partial pressure during growth have been investigated and it has been shown that the morphology of the films can be varied from the mirror like smooth tetrahedrally bonded carbon (ta-C) films through nanocluster to fibrous type carbon. This paper reviews the work carried out on Field Emission from these various carbon films. Threshold fields as low as 1 V/μm for emission current densities of 1 μA/cm2 and emission site densities of up to 104 -105/cm2 have been obtained.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 593: Symposium U – Amorphous & Nanostructured Carbon , 1999 , 207
Copyright
Copyright © Materials Research Society 2000

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References

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