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Low Temperature Ripple Formation: Ion-Induced Effective Surface Diffusion in Ion Sputtering

Published online by Cambridge University Press:  15 February 2011

M. A. Makeev  and
A.-L. Barabási
M. A. Makeev
Affiliation:
Department of Physics, University of Notre Dame, Notre Dame, IN 46656
A.-L. Barabási
Affiliation:
Department of Physics, University of Notre Dame, Notre Dame, IN 46656
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Abstract

Surfaces bombarded with energetic ions may develop a rough or a ripple surface morphology. The ripple formation has been successfully described by the instability caused by preferential erosion, the ripple wavelength being determined by the competition between surface erosion and thermally activated diffusion. However, as recent experiments and computer simulations have shown, ripple formation takes place even at the low temperatures, when thermally activated processes are suppressed. In this paper we propose a theory to explain low-temperature ripple formation based on the ion-induced effective surface diffusion.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 540: Symposium N / Microstructural Processes in Irradiated Materials , 1998 , 249
Copyright
Copyright © Materials Research Society 1999

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