Published online by Cambridge University Press: 21 February 2011
The investigation involved the synthesis of Si3N4 surface layers on a Ti substrate by a specially designed organosilazane liquid precursor, (CH3SiHNH)x with x=3 or 4, by pyrolysis with a 10.6 μm. continuous wave CO2 laser. Microstructural examinations revealed that the particles of the nitride layers were spherical in shape with diameters ranging from 50 to 150 nm. Based on the experimental evidence, suggestions are made of possible mechanisms occurring during film deposition.