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Investigations of Substrate-Selective Covalent Attachment for Genetically-Engineered Molecular Interconnects

Published online by Cambridge University Press:  01 February 2011

N. Rana
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
K. Bousman
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
G. S. Shekhawat
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
G. Sirinakis
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
F. Heuchling
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
J. Welch
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
E. T. Eisenbraun
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
R. E. Geer
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
A. E. Kaloyeros
Affiliation:
University at Albany Institute for Materials, Albany, NY 12203
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Abstract

Experimental investigations are presented regarding the surface-selective molecular selfassembly of fluorinated monochloroalkylsilane of the type (heptadecafluoro-1,1,2,2-tetrahydrodecyl) dimethylchlorosilane (denoted F17) on silicon dioxide (SiO2) and silicon nitride (Si3N4) surfaces. The goal is to investigate the controlled and selective surface self-assembly of these molecules as a potential route for substrate-selective covalent bonding of complex molecular assemblies to semiconductor substrates for on-chip interconnect and device applications. X-ray photoelectron spectroscopy (XPS), x-ray reflectivity (XRR) and atomic force microscopy (AFM) have been used to investigate the selectivity of the F17 self-assembly. Contrary to previous reported results, a high degree of F17 monolayer attachment selectivity is consistently observed between SiO2 and Si3N4 substrates for all three of the aforementioned monolayer characterization methods.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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