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Investigations of Mesoscopic Ferroelectric Structures Prepared by Imprint Lithography

Published online by Cambridge University Press:  11 February 2011

C. Harnagea ,
M. Alexe ,
J. Schilling ,
R. B. Wehrspohn ,
D. Hesse  and
U. Gösele
C. Harnagea
Affiliation:
Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle (Saale), Germany
M. Alexe
Affiliation:
Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle (Saale), Germany
J. Schilling
Affiliation:
Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle (Saale), Germany
R. B. Wehrspohn
Affiliation:
Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle (Saale), Germany
D. Hesse
Affiliation:
Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle (Saale), Germany
U. Gösele
Affiliation:
Max-Planck-Institut für Mikrostrukturphysik, D-06120 Halle (Saale), Germany
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Abstract

Arrays of mesoscopic ferroelectric PZT structures with lateral sizes from several micrometers down to below 300 nm were prepared applying nanoimprint lithography. The ferroelectric properties of the mesoscopic structures were investigated by scanning force microscopy in piezoresponse mode. The best chemical route to obtain ferroelectric structures was found to be the sol-gel method. Using Nb-doped SrTiO3 single crystals as bottom electrodes, the crystallization into the ferroelectric phase was uniform with grain sizes in the 35 nm range. The best ferroelectric properties of individual 300 nm structures were obtained if an intermediate, continuous ferroelectric layer was present on the bottom electrode.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 748: Symposium U – Ferroelectric Thin Films XI , 2002 , U4.2
Copyright
Copyright © Materials Research Society 2003

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References

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