Published online by Cambridge University Press: 25 February 2011
The reactions of titanium on germanium were studied using Raman spectroscopy and X-ray Absorption Spectroscopy (XAS). Samples used in this study were produced in a custom MBE system with dual E-gun sources, two filament sources, and base pressure <1x10−10 Torr. Ge(100) substrates were prepared by chemical cleaning and homoepitaxial deposition of 500Å - 1000Å Ge at 550°C. Ti was deposited and subsequently annealed at 50°C intervals from 500°C to 700°C. Raman and XANES spectra of the titanium germanides were obtained and used to examine the.evolution of the crystalline structures which form by the interface reactions of Ti on Ge. A low-order phase formed by diffusion controlled growth prior to the formation of TiGe2 (isomorphous with TiSi2 [C54]) by nucleation controlled growth.