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Inorganic-organic Hybrid Materials for Real 3-D Sub-νm Lithography

Published online by Cambridge University Press:  15 February 2011

R. Houbertz ,
J. Schulz ,
L. Fröhlich ,
G. Domann ,
M. Popall ,
J. Serbin  and
B. Chichkov
R. Houbertz
Affiliation:
to whom correspondence should be addressed
J. Schulz
Affiliation:
Fraunhofer Institute for Silicate Research ISC, Neunerplatz 2, 97082 Würzburg, Germany
L. Fröhlich
Affiliation:
Fraunhofer Institute for Silicate Research ISC, Neunerplatz 2, 97082 Würzburg, Germany
G. Domann
Affiliation:
Fraunhofer Institute for Silicate Research ISC, Neunerplatz 2, 97082 Würzburg, Germany
M. Popall
Affiliation:
Fraunhofer Institute for Silicate Research ISC, Neunerplatz 2, 97082 Würzburg, Germany
J. Serbin
Affiliation:
Laser Center Hannover LZH, Hollerithallee 8, 30419 Hannover, Germany
B. Chichkov
Affiliation:
Laser Center Hannover LZH, Hollerithallee 8, 30419 Hannover, Germany
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Abstract

Real 3-D sub-νm lithography was performed with two-photon polymerization (2PP) using inorganic-organic hybrid polymer (ORMOCER®) resins. The hybrid polymers were synthesized by hydrolysis/polycondensation reactions (modified sol-gel synthesis) which allows one to tailor their material properties towards the respective applications, i.e., dielectrics, optics or passivation. Due to their photosensitive organic functionalities, ORMOCER®s can be patterned by conventional photo-lithography as well as by femtosecond laser pulses at 780 nm. This results in polymerized (solid) structures where the non-polymerized parts can be removed by conventional developers.

ORMOCER® structures as small as 200 nm or even below were generated by 2PP of the resins using femtosecond laser pulses. It is demonstrated that ORMOCER®s have the potential to be used in components or devices built up by nm-scale structures such as, e.g., photonic crystals. Aspects of the materials in conjunction to the applied technology are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 780: Symposium Y – Advanced Optical Processing of Materials , 2003 , Y4.12
Copyright
Copyright © Materials Research Society 2003

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References

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