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In Situ Control of Wet Etching Using Spectroscopic Ellipsometry

Published online by Cambridge University Press:  10 February 2011

Sang-Jun Cho  and
P. G. Snyder
Sang-Jun Cho
Affiliation:
Department of Electrical Engineering and the Center for Microelectronic and Optical Materials Research, University of Nebraska, Lincoln, NE 68588-0511
P. G. Snyder
Affiliation:
Department of Electrical Engineering and the Center for Microelectronic and Optical Materials Research, University of Nebraska, Lincoln, NE 68588-0511
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Abstract

Etching of a GaAs/Al0.3Ga0.7As/GaAs heterostructure in a nonselective etch solution of 25:1:75 (citric acid: H2O2:H2O) was studied in-situ using real time spectroscopic ellipsometry (RTSE). Etch rates for GaAs and AIGaAs of 15.3 nm/min and 17.6 nm/min, respectively, were determined by numerically fitting RTSE data. RTSE was successfully used to stop the etch after removal of the thin GaAs cap, while removing very little of the underlying AlGaAs layer. In addition, etch depth into the AIGaAs layer was accurately controlled, using RTSE to stop the etch with 100 nm remaining. Finally, RTSE data for wet etching of a patterned sample (75% coverage with photoresist) showed similar behavior to that for the unpattemed sample.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 535: Symposium D/I – III-V and IV-IV Materials & Processing Challenges for Highly… , 1998 , 201
Copyright
Copyright © Materials Research Society 1999

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