Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-24T18:43:40.806Z Has data issue: false hasContentIssue false
  • English
  • Français

Growth of 130 μm Thick Epitaxial KNbO3 Film by Hydrothermal Method

Published online by Cambridge University Press:  23 January 2013

T. Shiraishi ,
H. Einishi ,
M. Ishikawa ,
T. Hasegawa ,
M. Kurosawa  and
H. Funakubo
T. Shiraishi
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
H. Einishi
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
M. Ishikawa
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan Department of Clinical Engineering Faculty of Biomedical Engineering, Toin University of Yokohama, 1614 Kurogane-cho, Aoba-ku, Yokohama, 225-8503, Japan
T. Hasegawa
Affiliation:
Department of Information Processing, Tokyo Institute of Technology, G2-32, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
M. Kurosawa
Affiliation:
Department of Information Processing, Tokyo Institute of Technology, G2-32, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
H. Funakubo
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502, Japan
Get access

Abstract

KNbO3 thick films were deposited on (100)c SrRuO3//(100)SrTiO3 substrates at 240 °C for 3 h by hydrothermal method. Film thickness increased linearly with increasing the deposition number of times and 130 μm thickness was achieved by the 6 time deposition. XRD analysis showed the growth of epitaxial orthorhombic films with the mixture orientation of (100), (010) and (001). Cross-sectional SEM observation showed that the 130 μm-thick film was dense and no obvious voids inside the film. In addition, the crystal structure change along film thickness direction was not detected from the cross-sectional Raman spectral observation.

Keywords

hydrothermalfilmcrystal growth
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1494: Symposium F – Oxide Semiconductors and Thin Films , 2013 , pp. 291 - 296
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Dorey, R.A. and Whatmore, R.W., J. Electroceram. 12, 19 (2004).CrossRefGoogle Scholar
Park, C. S., Kim, S. W., Park, G. T., Choi, J. J. and Kim, H. E., J. Mater. Res. 20, 243 (2005).CrossRefGoogle Scholar
Shrout, T. R. and Zhang, S. J., J. Electroceram. 19, 111 (2007).CrossRefGoogle Scholar
Saito, Y., Takao, H., Tani, T., Nonoyama, T., Takatori, K., Homma, T., Nagaya, T., and Akamura, M., Nature 432, 84 (2004).CrossRefGoogle Scholar
Chattopadhyay, S., Nichols, B. M., Hwang, J. H., Mason, T.O. and Wessels, B.W., J. Mater. Res. 17, 275 (2002).CrossRefGoogle Scholar
Wu, J. and Wang, J., J. Appl. Phys. 106, 066101 (2009).CrossRefGoogle Scholar
Rousseau, A., Laur, V., Viry, M. G., Tanné, G., Huret, F., Députier, S., Perrin, A., Lalu, F. and Laurent, P., Thin Solid Films 515, 2353 (2006).CrossRefGoogle Scholar
Ryu, J., Choi, J. J., Hahn, B. D., Park, D. S. and Yoon, W. H., Appl. Phys. Lett. 90, 152901 (2007).CrossRefGoogle Scholar
Shiraishi, T., Einishi, H., Yasui, S., Ishikawa, M., Hasegawa, T., Kurosawa, M., Uchida, H., Sakashita, Y., Funakubo, H., Jpn. J. Appl. Phys. 50, 09ND11-1-4 (2011).Google Scholar
Ishikawa, M., Yazawa, K., Fujisawa, T., Yasui, S., Yamada, T., Hasegawa, T., Morital, T., Kurosawa, M., Funakubo, H., Jpn. J. Appl. Phys. 48, 09KA14-1-5 (2009).Google Scholar
Hewat, A. W., J. Phys. C 6, 2559 (1973).CrossRefGoogle Scholar
Saito, K., Mitsuya, M., Nukaga, N., Yamaji, I.. Akai, T. and Funakubo, H., J. Appl. Phys. 39, 5489 (2000).CrossRefGoogle Scholar
Saip, J.A. B., Moor, E. R. and Cabrera, A.L., Solid State Commun. 135, 367 (2005).CrossRefGoogle Scholar
Handoko, A. D., Goh, G. K. L. and Chew, R. X., Cryst. Eng. Comm. 14, 421 (2011).CrossRefGoogle Scholar