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Gasdynamics and Chemistry in The Pulsed Laser Deposition of Oxide Dielectric Thin Films

Published online by Cambridge University Press:  22 February 2011

John W. Hastie ,
David W. Bonnell ,
Albert J. Paul  and
Peter K. Schenck
John W. Hastie
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
David W. Bonnell
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Albert J. Paul
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Peter K. Schenck
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

In the context of “chemistry and its effects on film quality,” we and a number of other research groups have developed spectroscopic and modeling approaches to better define the pulsed laser deposition process. An overview of these approaches is given here, using the results of recent work performed in our laboratory on the oxide dielectric systems of BaTiO3 and PbZr0.53Ti0.47O3(PZT).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 305
Copyright
Copyright © Materials Research Society 1994

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References

1. Plasma Processing of Materials, (Nat. Acad. Press, Washington, DC, 1991).Google Scholar
2 MRS Bulletin, 27, “Pulsed Laser Deposition,” (Special Edition), February, (1991).Google Scholar
3. Paul, A.J., Bonnell, D.W., Hastie, J.W., Schenck, P.K., Shull, R.D., and Ritter, J.J., Mat. Res. Soc. Symp. Proc. 236, 455 (1992).Google Scholar
4. Leuchtner, R.E., Horwitz, J.S., and Chrisey, D.B., Mat. Res. Soc. Symp. Proc. 285, 87 (1993).Google Scholar
5. Kelly, R. and Dreyfus, R.W., Nucl. Instr. and Meth. Phys. Res. B32, 341, (1988).Google Scholar
6. Hastie, J.W., Bonnell, D.W., and Schenck, P.K., High Temp.-High Press, 2Q, 73 (1988).Google Scholar
7. Schenck, P.K., Bonnell, D.W., and Hastie, J.W., High Temp. Sci., 27, 483 (1990).Google Scholar
8. Nir, I., Winniczee, J., Splichal, M.P., Anderson, H.M., and Stanton, A., Photonics Spectra, August, 1993, p.87.Google Scholar
9. Nordstom, R., Lasers and Optronics, Dec. p. 23 (1993).Google Scholar
10. Hastie, J.W., Bonnell, D.W., Paul, A.J., and Schenck, P.K., Mat. Res. Soc. Symp. Proc. 285, 39, (1993) (Note in Eqn. (3) of [10], v2 factor should be v3).Google Scholar
11. Dye, R. C., Brainard, R., Foltyn, S. R., Muenchausen, R. E., Wu, X. d., and Noger, N. S., Mat. Res. Soc. Symp. Proc. 285, 15 (1993).Google Scholar
12. Inam, A., Hegde, M.S., Wu, X.D., Venkatesan, T., England, P., and Micell, P.F., Appl. Phys. Lett. 51, 908 (1988).Google Scholar
13. Otis, C. E. and Dreyfus, R.W., Phys. Rev. Lett. 67, 2102 (1991).CrossRefGoogle Scholar
14. Eryu, O., Yamaska, K., and Masuda, K., Mat. Res. Soc. Symp. Proc. 28, 57 (1993).Google Scholar
15. Schenck, P.K., Vauden, M. D., and Hwang, Cheol-Seong, Crystal Structure and Crystal Texture in Laser-Deposited Thin Films of BaTiO3 , to be published (1993).Google Scholar
16. Kelly, R., SPIE Photochemistry in Thin Films, 258 (1989).Google Scholar
17. Kelly, R., J. Chem. Phys. L2 (8), 5047 (1990).Google Scholar
18. Kelly, R. and Braren, B., Appl. Phys. B53, 160 (1991).CrossRefGoogle Scholar
19. Kelly, R., Springer Series in Surface Sciences 12, 135 (1990).Google Scholar
20. Singh, R.K. and Narayan, J., Phys. Rev. B., 41, 8843 (1990).Google Scholar
21. Singh, R.K., Holland, O.W., and Narayan, J., J. Appl. Phys. 68, 233 (1990).Google Scholar
22. Yukya, S., Tsujino, J., Tatsumi, N., and Shishara, Y., J. Mater. Res. 5, 709 (1993).Google Scholar
23. Chen, C.H., Phillips, R.C., and Morrison, P.W., Mat. Res. Soc. Symp. Proc., 285, 45 (1993).Google Scholar
24. Predtechensky, M.R., Bulgarov, A.V., Mayorov, A.P., and Roshchin, A.V., Appl. Supercond., 1, 1995 (1993).Google Scholar