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Gasdynamics and Chemistry in The Pulsed Laser Deposition of Oxide Dielectric Thin Films

Published online by Cambridge University Press:  22 February 2011

John W. Hastie ,
David W. Bonnell ,
Albert J. Paul  and
Peter K. Schenck
John W. Hastie
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
David W. Bonnell
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Albert J. Paul
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Peter K. Schenck
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

In the context of “chemistry and its effects on film quality,” we and a number of other research groups have developed spectroscopic and modeling approaches to better define the pulsed laser deposition process. An overview of these approaches is given here, using the results of recent work performed in our laboratory on the oxide dielectric systems of BaTiO3 and PbZr0.53Ti0.47O3(PZT).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 305
Copyright
Copyright © Materials Research Society 1994

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