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Published online by Cambridge University Press: 11 February 2011
We propose a new procedure to grow GaN quantum dots (QDs) on AlN by using the Ga surfactant effect in plasma-assisted molecular beam epitaxy. Self-formed GaN islands were spontaneously generated under vacuum from a GaN 2D layer grown under Ga-rich conditions. Island characteristics (size and density) are studied as a function of the GaN coverage. We demonstrate that the QD density can be controlled in the 1010 cm−2 to 2 × 1011 cm−2 range. It is shown that beyond a given GaN thickness there is a coexistence between elastic and plastic relaxation.