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Ferroelectric Gates for Modulation of 2D Electron Gas at GaN/AlGaN Interfaces

Published online by Cambridge University Press:  26 February 2011

Igor Stolichnov
Affiliation:
[email protected], EPFL, IMX-LC, Station 12, Lausanne, VD, CH-1015, Switzerland, +41216934954, +41216935810
Lisa Malin
Affiliation:
Paul Muralt
Affiliation:
Nava Setter
Affiliation:
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Abstract

The Pb(Zr,Ti)O3 ferroelectric gate was successfully integrated into the GaN/AlGaN heterostructure with 2D electron gas. The processing conditions were optimized in a way to obtain high quality textured Pb(Zr,Ti)O3 films without destroying the 2D gas situated as close to the interface as 20nm. Study of transport properties in this system demonstrates a possibility to control the 2D gas by switching the spontaneous polarization in the gate. Concentration and mobility of electrons in the 2D gas were monitored using Hall effect and resistivity measurements in a wide temperature range from 4.2K to 300K. The polarization oriented in the direction “from bottom to top” provokes a partial depletion effect in the channel resulting in a conductivity decrease. A correlation between the depletion effect in 2D gas and the change of the spontaneous polarization with temperature has been observed. The depletion effect is found to be reversible so that the initial conductivity in 2D gas can be restored by inversing the spontaneous polarization in the gate. These results suggest that ferroelectric gates integrated into systems with 2D electron gas may be potentially interesting for a number of experiments and applications as a flexible and nondestructive way of making rewritable nanopatterns on semiconductor heterostructures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

1 Mathews, S., Ramesh, R., Venkatesan, T., and Benedetto, J., Science 276, 238 (1997).Google Scholar
2 Ishiwara, H., Ferroelectric random access memories. Fundamentals and applications, Vol. 93 (Springer-Verlag, Berlin, 2004).Google Scholar
3 Cao, W., Bhaskar, S., Li, J., and Dey, S. K., Thin Solid Films 484, 154 (2005).Google Scholar
4 Gruverman, A., Cao, W., Bhaskar, S., and Dey, S. K., Applied Physics Letters 84, 5153 (2004).Google Scholar
5 Dey, S. K., Bhaskar, S., Goswami, J., and Cao, W., Integrated Ferroelectrics 60, 69 (2004).Google Scholar
6 Shen, B., Li, W. P., Someya, T., Bi, Z. X., Liu, J., Zhou, H. M., Zhang, R., Yan, F., Shi, Y., Liu, Z. G., Zheng, Y. D., and Arakawa, Y., Jpn. J. Appl. Phys. Part 1, 41, 2528 (2002).Google Scholar
7 Kumar, M. S., Sumathi, R. R., Giridharan, N. V., Jayavel, R., and Kumar, J., Journal of Crystal Growth 237, 1176 (2002).Google Scholar
8 Masuda, A., Morita, S., Shigeno, H., Morimoto, A., Shimizu, T., Wu, J., Yaguchi, H., and Onabe, K., Journal of Crystal Growth 190, 227 (1998).Google Scholar
9 Hiboux, S., Muralt, P., and Maeder, T., Journal of Materials Research 14, 4307 (1999).Google Scholar
10 Baborowski, J., Muralt, P., Ledermann, N., and Hiboux, S., Vacuum 56, 51 (2000).Google Scholar
11 Motayed, A., Bathe, R., Wood, M. C., Diouf, O. S., Vispute, R. D., and Mohammad, S. N., Journal of Applied Physics 93, 1087 (2003).Google Scholar
12 Stolichnov, I., Colla, E., Tagantsev, A., Bharadwaja, S., Hong, S., Setter, N., Cross, J., and Tsukada, M., Appl. Phys. Lett. 80, 4804 (2002).Google Scholar
13 Tagantsev, A. and Stolichnov, I., Appl. Phys. Lett. 74, 1326 (1999).Google Scholar
14 Ahn, C., Tybell, T., Antognazza, L., Char, K., Hammond, R., Beasley, M., Fischer, O., and Triscone, J.M., Science 276, 1100 (1997).Google Scholar