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Fabricaton Of Granular Materials by High-Pressure Sputitering

Published online by Cambridge University Press:  28 February 2011

G.M. Chow ,
R.L. Holtz ,
C.L. Chien  and
A.S. Edelstein
G.M. Chow
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375 Research Associate of National Research Council, National Academy of Sciences
R.L. Holtz
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375 SFA, Inc., Landover, MD 20785
C.L. Chien
Affiliation:
Department of Physics and AstronomyJohns Hopkins University, Baltimore, MD 21218
A.S. Edelstein
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375
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Abstract

A brief study of the fabrication of granular materials by high-pressure sputtering is presented. This method utilizes sputtering at high pressures (p > 100 mTorr) in a thermal gradient to produce nanoscale particles, which are then embedded in a matrix by normal sputtering (p ∼ a few mTorr). The shape, size and the degree of aggregationof these nanoscale crystals can be changed by varying such processing parameters as the sputtering gas pressure and the target voltage. Examples are presented of nanocomposite films containing Mo nanocrystals (grain size ranging from 3 to 20 nm ) in an Al matrix.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 195: Symposium S – Physical Phenomena in Granular Materials , 1990 , 623
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Chow, G.M., Holtz, R.L., Pattnaik, A., Edelstein, A.S., Schlesinger, T.E. and Cammarata, R.C., Appl. Phys. Lett. 56, 1853 (1990).Google Scholar
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