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ERDA analysis of ZnSx(OH)y thin films obtained by chemical bath deposition

Published online by Cambridge University Press:  21 March 2011

Sven Neve ,
Wolfgang Bohne ,
Jörg Röhrich  and
Roland Scheer
Sven Neve
Affiliation:
Hahn-Meitner-Institut Berlin GmbH, Glienicker Str. 100, D-14109 Berlin, Germany, phone/fax: ++49-30-8062-2789
Wolfgang Bohne
Affiliation:
Hahn-Meitner-Institut Berlin GmbH, Glienicker Str. 100, D-14109 Berlin, Germany, phone/fax: ++49-30-8062-2789
Jörg Röhrich
Affiliation:
Hahn-Meitner-Institut Berlin GmbH, Glienicker Str. 100, D-14109 Berlin, Germany, phone/fax: ++49-30-8062-2789
Roland Scheer
Affiliation:
Hahn-Meitner-Institut Berlin GmbH, Glienicker Str. 100, D-14109 Berlin, Germany, phone/fax: ++49-30-8062-2789, email: [email protected]
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Abstract

Thin films of Zn-compounds grown in a chemical bath have been studied by Elastic Recoil Detection Analysis (ERDA). The bath contained zinc acetate, thiourea and complexing agents such as ammonia and hydrazine. Large amounts of hydrogen and oxygen are detected within all samples. A strong effect of the pH of the solution is revealed: At high pH (>11.5) mainly ZnS growth takes place, while at lower pH Zn(OH)2 is the dominant product. Hence the pH of the solution can be used to adjust the film stoichiometry. Deposition of Zn-compound films is possible without ammonia in the solution while presence of hydroxide ions and hydrazine species is necessary. It is proposed that film formation takes place via a complex combining hydrazine and hydroxide ligands.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 668: Symposium H – II-IV Compound Semiconductor Photovoltaic Materials , 2001 , H5.3
Copyright
Copyright © Materials Research Society 2001

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References

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