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Electron beam synthesis of 3D metal nanostructures from fluoride precursors

Published online by Cambridge University Press:  27 February 2012

Jay Ghatak
Affiliation:
Depertment of Materials Science and Engineering, University of Sheffield, S1 3JD, UK
T Gnanavel
Affiliation:
Depertment of Materials Science and Engineering, University of Sheffield, S1 3JD, UK
Wei Guan
Affiliation:
Depertment of Materials Science and Engineering, University of Sheffield, S1 3JD, UK
Günter Möbus
Affiliation:
Depertment of Materials Science and Engineering, University of Sheffield, S1 3JD, UK
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Abstract

Various metal fluoride crystals were subjected to electron beam irradiation at 200 and 300 kV using transmission electron microscopy in order to study in-situ fabrication of 3D metal nanostructures. Lithium fluoride, cobalt fluoride and aluminum fluoride salt fragments were chemically reduced and transformed by the electron beam to the corresponding metals. Using live video recording we observe that LiF crystals decompose in a unique way different to all other metal-halides. Li diffuses rapidly out of the salt crystal and covers its surface and the surrounding C-support film to many microns distance, where at random positions nucleation, growth and annihilation of Li nanorods and some nanospheres is observable. Decomposition of CoF2 also involves non-local synthesis of Co nanoparticles, mostly facetted, however, these are stable, without annihiliation, and their positioning seems to follow some degree of self-organisation. AlF3 transforms locally to Al grains inside the irradiated area only, and grain growth occurs to sizes proportional to the beam intensity. Findings are discussed in terms of displacement energy differences between the materials.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

1. Muray, A., Isaacson, M., and Adesidab, I., Appl. Phys. Lett., 45, 589 (1984).Google Scholar
2. Muray, A., Scheinfein, M., Isaacson, M. and Adesida, I., J. Vac. Sci. Techn. B, 3, 367 (1985).Google Scholar
3. Gierak, J., Vieu, C., Launois, H., Ben Assayag, G., and Septier, A., Appl. Phys. Lett., 70, 2049 (1997).Google Scholar
4. Langheinrich, W., Spangenberg, B., and Beneking, H., J. Vac. Sci. Techn. B, 10, 2868 (1992).Google Scholar
5. Malac, M., Schoefield, M., Zhu, Y. and Egerton, R., J. Appl. Phys., 92, 1112 (2002).Google Scholar
6. Streblechenk, Dmitry and Scheinfein, M. R., J. Vac. Sci. Technol. A, 1998, 16 1374.Google Scholar
7. Wang, F., Malac, M. and Egerton, R. F., Micron, 37, 316 (2006).Google Scholar
8. Gnanavel, T., Kumar, S., and Möbus, Günter, J. Nanosci. Nanotechnol, 11, 1019 (2010).Google Scholar
9. Perez, A., Balanzat, E. and Dural, J., Phys. Rev. B, 41, 3943 (1990).Google Scholar
10. Chen, G. S., Boothroyd, C. B. and Humphreys, C. J., Appl. Phys. Lett., 69, 170 (1996).Google Scholar
11. Saifullah, M. S. M., Botton, G. A., Boothroyd, C. B., and Humphreys, C. J., J. Appl. Phys., 86, 2499 (1999).Google Scholar
12. Schwartz, K., Volkov, A.E., Sorokin, M.V., Trautmann, C., Voss, K.-O., Neumann, R. and Lang, M., Phys. Rev. B, 78, 024120 (2008).Google Scholar
13. Möbus, G. and Tsai, J., Microsc Microanal, 14(Suppl 2), 248 (2008).Google Scholar
14. Yang, In-Sang, Anderson, A. C., Kim, Y. S. and Cotts, E. J., Phys. Rev. B, 40, 1297 (1989).Google Scholar
15. 29.Nadgorny, Edward M., Dimiduk, Dennis M. and Uchic, Michael D., Journal of Materials Research, 23, 2829 (2008).Google Scholar
16. Li, C., Gu, L., Tsukimoto, S., van Aken, P. A., and Maier, J., Adv. Mater., 22, 3650 (2010).Google Scholar
17. Li, C., Gu, L., Tong, J., Tsukimoto, S., and Maier, J., Adv. Funct. Mater., 21, 1391 (2011).Google Scholar
18. Nahum, J. and Wiegand, D. A., Phys. Rev., 154 817 (1967).Google Scholar
19. Youngkyoo, Kim, Nanotechnology, 19, 355207 (2008).Google Scholar
20. Hwajeong, Kim, Minjung, Shin and Youngkyoo, Kim, Europhysics Letters, 84, 58002 (2008).Google Scholar
21. Ghatak, Jay, Guan, Wei and Möbus, G., to be published.Google Scholar
22. Gnanavel, T., Möbus, G., to be published.Google Scholar
23. Herrmann, F., Pinard, P. and Farge, Y., J. Phys. C: Solid State Phys., 7, L199 (1974).Google Scholar