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Effects of In-Situ DC-Bias on the Composition, Microstructures and Dielectric Properties of RF Magnetron Reactive Sputtered (Ba,Sr)TiO3 Films

Published online by Cambridge University Press:  10 February 2011

Wen-Hao Chan ,
Hui-Ling Shen ,
Lih-Hsin Chou ,
Jinn-Lung Wang  and
Jyi-Ching Tsai
Wen-Hao Chan
Affiliation:
Dept of Materials Science and Engineering, National Tsing Hua University, Hsinchu, 300, Taiwan, R.O.C.
Hui-Ling Shen
Affiliation:
Present address: Lead Data Inc., Fu Kou Hsiang, Hsinchu, 303, Taiwan, R.O.C.
Lih-Hsin Chou
Affiliation:
Dept of Materials Science and Engineering, National Tsing Hua University, Hsinchu, 300, Taiwan, R.O.C.
Jinn-Lung Wang
Affiliation:
Chemical Systems Research Division, Chung-Shan Institute of Science and Technology, Lung-Tan, 325 Taiwan, R.O.C.
Jyi-Ching Tsai
Affiliation:
Chemical Systems Research Division, Chung-Shan Institute of Science and Technology, Lung-Tan, 325 Taiwan, R.O.C.
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Abstract

Thin films of (Ba,Sr)TiO3 (BST) have been prepared by rf magnetron reactive sputtering using single alloy target, and in-situ negative DC-bias. Post annealing was applied to the asdeposited films at 620°C for 2 hours in 1 atm oxygen atmosphere. Thin film microstructures and grain sizes were studied and calculated by means of X-ray diffraction, while the film composition was analyzed by Electron Probe X-ray Microanalyzer (EPMA). The dielectric constant of the films was also studied. As the applied DC-bias increased, the dielectric constant increased from 176 to 912, the x-ray diffraction patterns became more intense and narrower, and the (Ba+Sr)/Ti molar ratio increased from 0.70 to 0.83. In-situ DC-bias was observed to be a feasible fabrication process to increase the grain size and relative permittivity of sputtered BST films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 596: Symposium Y – Ferroelectric Thin Films VIII , 1999 , 43
Copyright
Copyright © Materials Research Society 2000

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