Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-28T08:32:52.375Z Has data issue: false hasContentIssue false

Effect of Cu Migration in a Field Induced Dielectric Failure

Published online by Cambridge University Press:  01 February 2011

Sang-Soo Hwang
Affiliation:
[email protected], Seoul National University, School of Material Sci. & Eng., San 56-1 Sillim-dong Gwanak-gu, Seoul, N/A, 151742, Korea, Republic of, 82-2-873-5818, 82-2-883-8197
Sung-Yup Jung
Affiliation:
[email protected], Seoul National University, School of Material Sci. & Eng., San 56-1 Sillim-dong Gwanak-gu, Seoul, N/A, 151-742, Korea, Republic of
Young-Chang Joo
Affiliation:
[email protected], Seoul National University, School of Material Sci. & Eng., San 56-1 Sillim-dong Gwanak-gu, Seoul, N/A, 151-742, Korea, Republic of
Get access

Abstract

For the study of dielectric failures by Cu migration, TDDB (time dependent dielectric breakdown) and 1-D FDM simulation was carried out. We tested TDDB using a simple MIS structure with no barrier Cu electrode. From our TDDB results, the TTF's in the acceleration condition and the characteristic parameter of TDDB were obtained. In the simulation parts, 1-D FDM simulation was accomplished considering space charge effect due to Cu ions.

The objective of TDDB is to predict of TTF (time to failure) in the service condition form the results of an accelerating condition. The characteristic of TTF's follows E model in the accelerating condition, in the service condition, the deviation from E model was observed. This different characteristic of TTF can be explained by the mechanism of Cu migration enhanced by an applied E field. Our simulation and TDDB results reveal that the deviation from E model does not mean the change of failure mechanism, but it shows the characteristics of Cu migration.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Suñé, J., IEEE Elec. Dev. Lett. 22 296 (2001)Google Scholar
2 McPherson, J. W., Reddy, V. K., and Mogul, H. C., Appl. Phys. Lett. 71, 1101 (1997).Google Scholar
3 Tomita, T., Utsunomiya, H., Kamakura, Y., and Taniguchi, K., Appl. Phys. Lett. 71, 3664 (1997).Google Scholar
4 McBrayer, J. D., Ph. D. thesis, Stanford University (1983).Google Scholar
5 Wu, W., Duan, X. and Yuan, J. S., 41st IRPS 2003, p. 282.Google Scholar
6 Chen, F., Bravo, O., Chanda, K., McLaughlin, P., Sullivan, T., Grill, J., Lloyd, J., Kontra, R., and Aitken, J., 44th IRPS 2006, p. 46.Google Scholar
7 Kwon, J. –Y., Kim, K. –Su, Joo, Y. -C., and Kim, K. –B, Japanese J. Appl. Phys. 41 L99 (2002).Google Scholar