Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-28T06:26:58.341Z Has data issue: false hasContentIssue false

Donors and Acceptors in Bulk ZnO Grown by the Hydrothermal, Vapor-phase, and Melt Processes

Published online by Cambridge University Press:  01 February 2011

David Look*
Affiliation:
[email protected], Wright State University, Semiconductor Research Center, 3640 Colonel Glenn Highway, Dayton, OH, 45435, United States, 937-255-1725, 937-255-3374
Get access

Abstract

The optical and electrical properties of commercially available bulk ZnO samples grown by the hydrothermal, vapor-phase, and melt methods are compared. Low-temperature photoluminescence (PL) is used to identify the presence of common impurities, such as H, Al, Ga, and In, and temperature-dependent Hall-effect (T-Hall) measurements are used to obtain donor energies and to quantify donor and acceptor concentrations. All three types of material produce sharp donor-bound-exciton (D0X) PL lines, I4, I6, I8, and I9, generally associated with H, Al, Ga, and In, respectively. However, the I4 and I9 lines are weak in hydrothermal ZnO, and the I4 line is also weak in melt material. Another D0X line I5, possibly associated with donors near the surface, appears in some hydrothermal samples. Electrically, hydrothermal ZnO has a much lower bulk conductivity than vapor-phase or melt ZnO, partly because the donor concentration is lower, but also because the acceptor concentration is higher. A consequence of the low bulk conductance is that surface conductance becomes much more important and must be included in the Hall-effect modeling. An interesting result of this study is a close correlation between the PL-derived Al (I6) donor energy of 51 meV, and the T-Hall-derived energy of 52 meV.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. ZN Technology, Inc., 910 Columbia Street, Brea, CA 92821.Google Scholar
2. Cermet, Inc., 1019 Collier RD, Suite C-1, Atlanta, GA 30318.Google Scholar
3. Tokyo Denpa Co., Ltd., 5-6-11 Chuo, Ohta-ku, Tokyo 143-0024, Japan.Google Scholar
4. Look, D.C., Electrical Characterization of GaAs Materials and Devices (Wiley, New York, 1989), Ch.1.Google Scholar
5. Look, D.C., Fang, Z-Q., and Claflin, B., J. Crystal Growth 281, 143 (2005).Google Scholar
6. Look, D.C., Mater. Sci. and Eng. B 80, 383 (2001).Google Scholar
7. Look, D.C., Superlattices and Microstructures (in press).Google Scholar
8. Schmidt, O., Kiesel, P., Van de Walle, C.G., Johnson, N.M., Nause, J., and Döhler, G.H., Jpn. J. Appl. Phys. Part 1, 44, 7271 (2005).Google Scholar
9. Look, D.C., Mosbacker, H.L., Strzhemechny, Y.M., and Brillson, L.J., Superlattices and Microstructures 38, 406 (2005).Google Scholar
10. Meyer, B.K., Alves, H., Hofmann, D.M., Kriegseis, W., Forster, D., Bertram, F., Christen, J., Hoffmann, A., Strassburg, M., Dworzak, M., Haboeck, U., and Rodina, A.V., phys. stat. sol. (b) 241, 231 (2004).Google Scholar
11. Nickel, N. and Fleischer, K., Phys. Rev. Lett. 90, 197402 (2003).Google Scholar
12. Maeda, K., Sato, M., Niikura, I., and Fukuda, T., Semicond. Sci. and Technol. 20, S49 (2005).Google Scholar
13. Oila, J., Kivioja, J., Ranki, V., Saarinen, K., Look, D.C., Molnar, R.J., and Park, S.S., Appl. Phys. Lett. 82, 3433 (2003).Google Scholar
14. Look, D.C., Farlow, G.C., Reunchan, P., Limpijumnong, S., Zhang, S.B., and Nordlund, K., Phys. Rev. Lett. 95, 225502 (2005).Google Scholar