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Design of a Large-Scale Plasma Source Ion Implantation Experiment*

Published online by Cambridge University Press:  25 February 2011

B. P. Wood ,
J. T. Scheuer ,
M. A. Nastasi ,
R. H. Olsher ,
W. A. Reass ,
I. Henins  and
D. J. Rej
B. P. Wood
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
J. T. Scheuer
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
M. A. Nastasi
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
R. H. Olsher
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
W. A. Reass
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
I. Henins
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
D. J. Rej
Affiliation:
Los Alamos National Laboratory, MS-E526, Los Alamos, NM 87545
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Abstract

In Plasma Source Ion Implantation (PSII), a target to be implanted is immersed in a weakly ionized plasma and pulsed to a high negative voltage. Ions in the plasma are accelerated toward the target and implanted in its surface, thereby modifying the properties of the surface. Experimental results reported in the literature have generally been for small targets. We present here the design of a large-scale PSII experiment being assembled Los Alamos National Laboratory, in which we plan to implant targets with surface areas exceeding 1 m2 to doses of up to 5 × 1017 cm−2. In presenting this design, we use Monte Carlo and particle-in-cell simulations to examine sheath expansion, implant current and dose, secondary electron emission, target sputtering, implant depth, and x-ray emission resulting from secondary electrons hitting the vacuum chamber wall.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 279: Symposium A – Beam-Solid Interactions–Fundamentals and Applications , 1992 , 345
Copyright
Copyright © Materials Research Society 1993

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Footnotes

*

Work supported by U. S. Department of Energy.

References

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