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Correlations Between the Substrate Temperature, Properties and Tribological Performance of Sputter-Deposited Amorphous Carbon Films
Published online by Cambridge University Press: 15 February 2011
Abstract
Amorphous carbon films have been deposited on various grounded substrates by direct current (DC) magnetron sputtering from a graphite target in an argon discharge. The argon pressure and sputtering power density were fixed at 0.25 Pa and 2.65 W cm−2, respectively. The substrate temperature was varied from 50 to 350°C. The hydrogen content determined by ERDA and the electrical resistivity of films were found to be dependent on the base pressure in the deposition chamber and substrate temperature. The mass density of films evaluated from RBS data and compressive residual stresses in the films decreased with increasing substrate temperature from 2.2 to 1.4 g cm−3 and - 0.6 to - 0.2 GPa, respectively. The friction coefficient and wear rate of about 2-μm-thick carbon films deposited on polished stainless steel disks were determined by alumina ball-on-disk tribological measurements conducted in dry air under a load of 4.9 N with a sliding velocity of 10 m min−1 for 105 cycles. The tribological performance of carbon-coated disks are correlated with the deposition temperature and physical characteristics of carbon films.
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- Copyright © Materials Research Society 1995
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