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Contribution of the Nanocrystallites and Their Interfaces to the Optical Response of Porous Silicon Layers
Published online by Cambridge University Press: 28 February 2011
Abstract
We discuss the dependence of the dielectric function on the nanocrystalline size of porous silicon layers. The layers were grown by a standard electrochemical process and characterized by spectroscopic ellipsometry. By a lineshape analysis values of the critical point energies and broadening parameters of the Interband critical points were derived. In order to obtain further information about the nanocrystallites, the preparation conditions were varied (HF concentration, NH4F was added) or the layers were further treated by etching and arsenic deposition. The lineshape analysis values indicate that the layers consist mainly of nanocrystallites, or more accurately, that the electrons are confined to regions of a few nanometers in size. Furthermore, there is strong indication that some preparation conditions may leave these nanocrystallites heavily strained .
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- Copyright © Materials Research Society 1995
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