Hostname: page-component-78c5997874-mlc7c Total loading time: 0 Render date: 2024-11-08T00:14:13.624Z Has data issue: false hasContentIssue false

Compositional Modulation and its Optoelectric Properties of Zn(S,Se,Te) Crystals Grown by Hydrogen Radical-Enhanced CVD

Published online by Cambridge University Press:  10 February 2011

Hiroyuki Fujiwara
Affiliation:
The Graduate School at Nagatsuta, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku Yokohama, 226 Japan
Toshihiro Ii
Affiliation:
The Graduate School at Nagatsuta, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku Yokohama, 226 Japan
Isamu Shimizu
Affiliation:
The Graduate School at Nagatsuta, Tokyo Institute of Technology, 4259 Nagatsuta Midori-ku Yokohama, 226 Japan
Get access

Abstract

High-quality (ZnS)n(ZnSe)12n and (ZnSe)n(ZnTe)11n (n=1∼4) crystals were grown at a low temperature of 200°C by hydrogen radical-enhanced chemical vapor deposition. From satellite peaks in x-ray diffraction spectra, these periodic structure crystals were confirmed to be grown coherently on substrates, in spite of large lattice mismatches between the grown layers and the substrates (͛=4∼7%). In photoluminescence (PL) spectra of these films, strong band-edge emissions were predominantly observed, resulting from a suppression of deep-level emissions. We found that the PL peak energy of (ZnSe)n(ZnTe)11n shifts systematically to lower energy by 200 meV with changes in the number of ZnSe layers (n), while relatively small shift of 13 meV was observed in (ZnS)n(ZnSe)12n. These discrepancy can be attributed to the difference of band-lineups or chemical natures of constituent atoms in these crystals.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Mitsuhashi, H., Mitsuishi, I., and Kukimoto, H., Jpn. J. Appl. Phys. 64, 2403 (1988).Google Scholar
2. Ishibashi, A. and Mori, Y., J. Cryst. Growth 138, 677 (1994).Google Scholar
3. Permogorov, S. and Reznitsky, A., J. Lumin. 52, 201 (1992).Google Scholar
4. Fujiwara, H., Kiryu, H. and Shimizu, I., J. Appl. Phys. 77, 3927 (1995).Google Scholar
5. Fujiwara, H., Gotoh, J., Shirai, H. and Shimizu, I., J. Appl. Phys. 74, 5510 (1993).Google Scholar
6. Fujiwara, H., Nabeta, T. and Shimizu, I., Jpn. J. Appl. Phys. 33, 2474 (1994).Google Scholar
7. Tokumitsu, E., Jpn. J. Appl. Phys. 29, L698 (1990).Google Scholar
8. Oigawa, H., Fan, J., Nannichi, Y., Sugahara, H. and Oshima, M., Jpn. J. Appl. Phys. 30, L322 (1991).Google Scholar
9. Shazad, K., Olego, D. J. and Van de Walle, C. G., Phys. Rev. B 38, 1417 (1988).Google Scholar
10. Van de Walle, C. G., Phys. Rev. B 39, 1871 (1989).Google Scholar