Hostname: page-component-745bb68f8f-mzp66 Total loading time: 0 Render date: 2025-02-05T07:20:37.287Z Has data issue: false hasContentIssue false
  • English
  • Français

The Chemistry of Boron and Titanium Diboride Formation: Decomposition of TiCl4 and BCl3 in Hydrogen and Helium*

Published online by Cambridge University Press:  10 February 2011

Thomas H. Osterheld  and
Mark D. Allendorf
Thomas H. Osterheld
Affiliation:
Sandia National Laboratories, Mail Stop 9052 Livermore, CA 94551-0969
Mark D. Allendorf
Affiliation:
Sandia National Laboratories, Mail Stop 9052 Livermore, CA 94551-0969
Get access

Abstract

Measurements of the decomposition of mixtures of boron trichloride (BCl3), titanium tetrachloride (TiCl4), and hydrogen at elevated temperatures are presented. The decomposition of BCl3 with hydrogen appears to drive the chemistry in this system. The species depositing boron on the surface contains at least 2 chlorine atoms. Once deposited, the surface chlorine is removed by reaction with hydrogen to form HCl and, presumably, surface B-H bonds.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 410: Symposium S – Covalent Ceramics III-Science and Technology of Non-Oxides , 1995 , 465
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Schwartz, M., Composite Materials Handbook. (McGraw-Hill, Inc., New York, 1992).Google Scholar
2. Besmann, T. M., Spear, K. E., Journal of the Electrochemical Society 124, 790 (1977).Google Scholar
3. Rebenne, H., Pollard, R., Journal of the Electrochemical Society 132, 1932 (1985).Google Scholar
4. Vandenbulcke, L., Vuillard, G., Journal of the Electrochemical Society 124, 1931 (1977).Google Scholar
5. Carlton, H. E., Oxley, J. H., Hall, E. H., Blocher, J. M. Jr., Blocher, J. M. Jr., Witherss, J. C., Ed., Eds., Proc. of the 2nd Int. Conf. on Chemical Vapor Deposition (The Electrochemical Society, 1970), pp. 209.Google Scholar
6. Carlsson, J.-O., Sedgwick, T. O., Lydtins, H., Ed., Eds., Proc. of the 7th Int. Conf. on Chemical Vapor Deposition (The Electrochemical Society, 1979), vol.79, pp. 332.Google Scholar
7. Nadal, M., Grenet, T., Teyssandier, F., J. De Phys. IV C3 3, 511 (1993).Google Scholar
8. Keyser, L. F., Journal of Physical Chemistry 88, 4750 (1984).Google Scholar
9. Schlegel, H. B., Harris, S. J., Journal of Physical Chemistry 98, 11178 (1994).Google Scholar
10. Chase, M. W. J., et al., Journal of Physical and Chemical Reference Data 14, 860 (1985).Google Scholar
11. Osterheld, T. H., Allendorf, M. D., Melius, C. F., to be published.Google Scholar