Hostname: page-component-5cf477f64f-h6p2m Total loading time: 0 Render date: 2025-04-06T12:02:35.409Z Has data issue: false hasContentIssue false
  • English
  • Français

Atmospheric Stability of E-Beam Deposited Optical Thin Film Stacks

Published online by Cambridge University Press:  01 February 2011

Ping Hou ,
Lianchao Sun  and
Fei Luo
Ping Hou
Affiliation:
Nortel Networks Corp., Wilmington, MA 01887
Lianchao Sun
Affiliation:
Sun International (USA), Acton, MA 01720
Fei Luo
Affiliation:
Electrical and Computer Engineering, Boston University, Boston, MA 02215
Get access

Abstract

Optical thin films with SiO2-TiO2 stack were prepared by the technology of electron beam (e-beam) evaporation with ion beam assistant deposition (IBAD). The mechanical (stress) and optical properties of as-deposited thin films were studied as a function of exposure time in the atmospheric environment. Exposing to the air at the ambient temperature causes incremental compressive stress and spectrum profile changes, which is related to the absorption of water moisture into the films. Making a dense film is, therefore, a practical approach to improve structural stability of thin films and then the performance of optical devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 854: Symposium U – Stability of Thin Films and Nanostructures , 2004 , U8.13
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Bendavid, A., et al., Structural and optical properties of titanium oxide thin films deposited by filtered arc deposition. Thin Solid Films, 1999. 355: p. 6–11.Google Scholar
2. Bendavid, A., Martin, P.J., and Takikawa, H., Deposition and modification of titanium dioxide thin films by filtered arc deposition. Thin Solid Films, 2000. 360(1–2): p. 241–249.Google Scholar
3. Du, X.M. and Almeida, R.M., Effects of thermal treatment on the structure and properties of SiO2-TiO2 gel films on silicon substrates. Journal of Sol-Gel Science and Technology, 1997. 8(1–3): p. 377–380.Google Scholar
4. Sun, L. and Hou, P.. Evaluation on stress and optical property of thin films used in optical MEMS device. in Thin Films - Stresses and Mechanical Properties X, Dec 1–5 2003. 2003. Boston, MA., United States: Materials Research Society.Google Scholar
5. Windischmann, H. and Epps, D.F., J. Appl. Phys., 1991. 69: p. 2231.Google Scholar
6. Law, B.M. and Beaglehole, D., Model Calculations of the Ellipsometric Properties of Inhomogeneous Dielectric Surfaces. Journal of Physics D: Applied Physics, 1981. 14(2): p. 115–126.Google Scholar
7. Lohner, T., et al., Ellipsometric characterization of oxidized porous silicon layer structures. Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 2000. 69: p. 182–187.Google Scholar
8. Luciani, L. and Denoyel, R., Ellipsometric study of adsorption of three surfactants on a titania thin film. Langmuir, 1997. 13(26): p. 7301–7303.Google Scholar
9. Martensson, J., et al., Adsorption and optical properties of ferritin layers on gold studied with spectroscopic ellipsometry. Journal of Colloid and Interface Science, 1995. 174(1): p. 79.Google Scholar
10. Smith, G.B. and Dligatch, S., Ellipsometric studies of nanocomposite cermets. Nanostructured Materials, 1999. 12(1): p. 535–538.Google Scholar