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Accuracy Improvements in LPC Measurements for CMP Slurries

Published online by Cambridge University Press:  31 January 2011

Bruno Tolla  and
David Boldridge
Bruno Tolla
Affiliation:
[email protected], Cabot Microelectronics Corporation, Aurora, Illinois, United States
David Boldridge
Affiliation:
[email protected], Cabot Microelectronics Corporation, Aurora, Illinois, United States
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Abstract

We have examined the Large Particle Count (LPC) analytical method to see whether there are opportunities to improve both the accuracy and precision in hope of improving the utility of the LPC measurement. We have identified weaknesses in the current method that limit both its accuracy and its precision, and which can introduce count errors in excess of a factor of 10. We propose modifications to the current method which result in both accuracy and precision improvements. We recommend these improvements as absolutely necessary for any experiments designed to test the correlation between LPC and defectivity.

Keywords

CMPparticulateoptical
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1157: Symposium E – Science and Technology of Chemical Mechanical Planarization (CMP) , 2009 , 1157-E04-07
Copyright
Copyright © Materials Research Society 2009

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