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3D Structure Fabrication by FIB Milling and Deposition

Published online by Cambridge University Press:  26 February 2011

Toshiaki Fujii ,
Koji Iwasaki ,
Masanao Munekane ,
Yo Yamamoto ,
Toshitada Takeuchi ,
Masakatsu Hasuda ,
Yutaka Ikku ,
Hiromi Tashiro ,
Tatsuya Asahata  and
Masahiro Kiyohara
...Show all authors
Toshiaki Fujii
Affiliation:
[email protected], SII NanoTechnology Inc., Engineering Department, 36-1 Takenoshita, Oyama-cho, Sunto-gun, 412-0026, Japan
Koji Iwasaki
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Masanao Munekane
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Yo Yamamoto
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Toshitada Takeuchi
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Masakatsu Hasuda
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Yutaka Ikku
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Hiromi Tashiro
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Tatsuya Asahata
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Masahiro Kiyohara
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
Takashi Kaito
Affiliation:
[email protected], SII NanoTechnology Inc., Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan
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Abstract

Focused Ion Beam (FIB) system is equipment used to make a wide variety of micro and Nano structures. Structures can be created using various materials by irradiating focused gallium ion beam on to the surface of specimens and by sputtering, etching and ion beam induced deposition. In order to realize greater diversity for nano construction by using the FIB system, we have developed technologies incorporating:

- Built-in pattern signal generator

- Multiple Gas Unit for gas assisted etching and beam induced deposition

- A precision wheel for the stage.

This latest FIB system has a narrow Ion beam with a diameter of better than 4nm. Beam current is controlled from 0.15pA to 20nA. These performances contribute significantly to the study 3D structures fabrication and modification.

Keywords

microelectro-mechanical (MEMS)ion-beam assisted depositionion-beam processing
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 983: Symposium LL – Focused Ion Beams for Analysis and Processing , 2006 , 0983-LL08-08
Copyright
Copyright © Materials Research Society 2007

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References

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