Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-24T16:06:15.871Z Has data issue: false hasContentIssue false

A1Bi3C6 Thin Films as NO Sensors

Published online by Cambridge University Press:  01 February 2011

Halyna Khlyap
Affiliation:
[email protected], University, Physics, Disteldtr.11, Kaiserslautern, Rheinland-Pfalz, D-67657, Germany, +49 631 340 4772, -
Violetta Bilozertseva
Affiliation:
[email protected], Polytechnical University, Kharkov, -, UA-61661, Ukraine
Nina Dyakonenko
Affiliation:
[email protected], Polytechnical University, Kharkov, -, UA-61661, Ukraine
Dmitrii Gaman
Affiliation:
[email protected], Polytechnical University, Kharkov, UA-61661, Ukraine
Andrey Mamalui
Affiliation:
[email protected], PolytechnicalUniversity, Kharkov, -, UA-61661, Ukraine
Hayna M. Khlyap
Affiliation:
[email protected], University, Physics, E.-Schroedinger-Str. 56, Kaiserslautern, N/A, 67663, Germany
Get access

Abstract

The paper reports experimental data on growth, morphology, NO sensitivity and electrophysical properties of A1Bi3C6 thin films obtained by means of simple vacuum technology. The investigated samples were condensed onto the glass substrates under deposition rate 0.1-0.5 nm/s at T = 300 K and vacuum level P = 10-3 Pa. AFM investigations of the film surface before and after interaction with aggressive environment demonstrated sufficient sensitivity of the film relief to the aggressive component. Room-temperature electric field-induced characteristics were investigated for metal-semiconductor (MS) Cr/NaBiTe2 structures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Bilozertseva, V., Ryabchun, A., Dyakonenko, N., Petrenko, L., Gapochenko, S., Photoelectronics 12, 20 (2003).Google Scholar
2 Ulrich, M., Bunde, A., Kohl, C.-D. Appl. Phys. Lett. 85, 242 (2004).Google Scholar
3 Takahashi, M., Kojima, M., Sato, S., Ohnisi, N. et al. J. Appl. Phys. 96, 5582 (2004).Google Scholar
4 Lukyanova, L.N., Kutasov, V.A., Konstantinov, P.P. Semiconductors (Russia) 47, 224 (2004).Google Scholar
5 Volkenstein, F.F. Electronic processes on the semiconductor surface under chemosorption. Moscow, Nauka Publishers, 1987. 432 p.Google Scholar
6 Nosov, Yu. R., Shilin, B. A. The principles of charge-coupled devices physics. Moscow, Nauka Publishers, 1986. 320 p.Google Scholar