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Tunable indium tin oxide for metamaterial perfect absorbers and nonlinear devices

Published online by Cambridge University Press:  24 August 2020

Evan M. Smith ,
Joshua R. Hendrickson ,
Justin W. Cleary ,
Kevin Leedy ,
Junpeng Guo  and
Shivashankar Vangala
Evan M. Smith*
Affiliation:
KBR, 2601 Mission Point Blvd, Beavercreek, OH45431, USA
Joshua R. Hendrickson
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, USA
Justin W. Cleary
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, USA
Kevin Leedy
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, USA
Junpeng Guo
Affiliation:
Department of Electrical and Computer Engineering, University of Alabama in Huntsville, Huntsville, AL35899, USA
Shivashankar Vangala
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson Air Force Base, OH 45433, USA
*
Address all correspondence to Evan M. Smith at [email protected]
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Abstract

Indium tin oxide (ITO) has become a very useful plasmonic and nonlinear optical material because of its highly tunable electrical and optical properties and strong optical nonlinearity. In this work, the authors conducted detailed fabrication process studies by using high-temperature reactive sputtering to finely tune the optical properties of ITO thin films, particularly the epsilon-near-zero (ENZ) wavelength in the near and mid-IR spectrum. Sputtered ITO thin films are characterized by using spectroscopic ellipsometry, surface profilometry, Hall measurements, and 4-point probe testing. Additionally, the effect of post-deposition annealing of ITO films is also investigated.

Type
Research Letters
Information
MRS Communications , Volume 10 , Issue 4 , December 2020 , pp. 573 - 578
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Copyright
Copyright © The Author(s), 2020, published on behalf of Materials Research Society by Cambridge University Press

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