Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Ferreira, Paula G.
Ajdari, Armand
and
Leibler, Ludwik
1998.
Scaling Law for Entropic Effects at Interfaces between Grafted Layers and Polymer Melts.
Macromolecules,
Vol. 31,
Issue. 12,
p.
3994.
Jopp, Jürgen
and
Yerushalmi-Rozen, Rachel
1999.
Autophobic Behavior of Polymers at the Melt−Elastomer Interface.
Macromolecules,
Vol. 32,
Issue. 21,
p.
7269.
Binder, K.
1999.
Polymers in Confined Environments.
Vol. 138,
Issue. ,
p.
1.
Fluegel, B.
Zhang, Y.
Mascarenhas, A.
Geisz, J. F.
Olson, J. M.
and
Duda, A.
1999.
Crystal anisotropy and spin-polarized photoluminescence of orderedGaxIn1−xP.
Physical Review B,
Vol. 60,
Issue. 16,
p.
R11261.
Zolotoyabko, E.
Goldner, A.
and
Komem, Y.
1999.
Thickness effect in the atomic ordering of strainedGaxIn1−xPlayers.
Physical Review B,
Vol. 60,
Issue. 15,
p.
11014.
Balazs, Anna C.
Singh, Chandralekha
Zhulina, Ekaterina
and
Lyatskaya, Yulia
1999.
Modeling the Phase Behavior of Polymer/Clay Nanocomposites.
Accounts of Chemical Research,
Vol. 32,
Issue. 8,
p.
651.
Dang, T. D.
Mather, P. T.
Alexander, M. D.
Grayson, C. J.
Houtz, M. D.
Spry, R. J.
and
Arnold, F. E.
2000.
Synthesis and characterization of fluorinated benzoxazole polymers with highTg and low dielectric constant.
Journal of Polymer Science Part A: Polymer Chemistry,
Vol. 38,
Issue. 11,
p.
1991.
Morgen, Michael
Ryan, E. Todd
Zhao, Jie-Hua
Hu, Chuan
Cho, Taiheui
and
Ho, Paul S.
2000.
Low Dielectric Constant Materials for ULSI Interconnects.
Annual Review of Materials Science,
Vol. 30,
Issue. 1,
p.
645.
Slep, D.
Asselta, J.
Rafailovich, M. H.
Sokolov, J.
Winesett, D. A.
Smith, A. P.
Ade, H.
and
Anders, Simone
2000.
Effect of an Interactive Surface on the Equilibrium Contact Angles in Bilayer Polymer Films.
Langmuir,
Vol. 16,
Issue. 5,
p.
2369.
Shi-jin, Ding
Peng-fei, Wang
Wei, Zhang
Ji-tao, Wang
Lee, Wei William
Ye-wen, Zhang
and
Zhong-fu, Xia
2000.
Porous amorphous fluoropolymer films with ultralow dielectric constant.
Chinese Physics,
Vol. 9,
Issue. 10,
p.
778.
Zhang, Yong
Mascarenhas, Angelo
and
Wang, Lin-Wang
2001.
Statistical aspects of electronic and structural properties in partially ordered semiconductor alloys.
Physical Review B,
Vol. 64,
Issue. 12,
Han, Sang-Soo
and
Bae, Byeong-Soo
2001.
Thermal Stability of Fluorinated Amorphous Carbon Thin Films with Low Dielectric Constant.
Journal of The Electrochemical Society,
Vol. 148,
Issue. 4,
p.
F67.
Sugahara, Satoshi
Kadoya, Tomohiro
Usami, Koh-ichi
Hattori, Takeo
and
Matsumura, Masakiyo
2001.
Preparation and Characterization of Low-k Silica Film Incorporated with Methylene Groups.
Journal of The Electrochemical Society,
Vol. 148,
Issue. 6,
p.
F120.
Morón, M. C.
and
Hull, S.
2001.
Role of an order-disorder phase transition in increasing the exchange magnetic field in a diluted magnetic semiconductor.
Physical Review B,
Vol. 64,
Issue. 22,
Biver, C.
de Crevoisier, G.
Girault, S.
Mourran, A.
Pirri, R.
Razet, J. C.
and
Leibler, L.
2002.
Microphase Separation and Wetting Properties of Palmitate-graft-poly(vinyl alcohol) Films.
Macromolecules,
Vol. 35,
Issue. 7,
p.
2552.
Morón, M. C.
and
Hull, S.
2003.
Order-disorder phase transition inZn1−xMnxGa2Se4: Long-range order parameter versusx.
Physical Review B,
Vol. 67,
Issue. 12,
Chen, S. T.
Chen, G. S.
and
Yang, T. J.
2003.
Plasma Passivation of Siloxane-Based Low-k Polymeric Films.
Journal of The Electrochemical Society,
Vol. 150,
Issue. 10,
p.
F194.
Lee, Hean Ju
Oh, Kyoung Suk
and
Choi, Chi Kyu
2003.
The mechanical properties of the SiOC(H) composite thin films with a low dielectric constant.
Surface and Coatings Technology,
Vol. 171,
Issue. 1-3,
p.
296.
Chen, S. T.
Chen, G. S.
Yang, T. J.
Chang, T. C.
and
Yang, W. H.
2003.
The Synergistic Effect of N[sub 2]/H[sub 2] Gases in the Plasma Passivation of Siloxane-Based Low-k Polymer Films.
Electrochemical and Solid-State Letters,
Vol. 6,
Issue. 1,
p.
F4.
Mabboux, Pierre-Yves
and
Gleason, Karen K.
2005.
Chemical Bonding Structure of Low Dielectric Constant Si:O:C:H Films Characterized by Solid-State NMR.
Journal of The Electrochemical Society,
Vol. 152,
Issue. 1,
p.
F7.