Hostname: page-component-745bb68f8f-b6zl4 Total loading time: 0 Render date: 2025-02-03T10:34:31.319Z Has data issue: false hasContentIssue false
  • English
  • Français

Nanoimprint Lithography and Lithographically Induced Self-Assembly

Published online by Cambridge University Press:  31 January 2011

Stephen Y. Chou
Get access

Extract

Our ability to pattern nanostructures offers a unique path to discovery and innovation in science and technology. When nanostructures are smaller than a fundamental physical length scale, conventional theory may no longer apply, and new phenomena emerge.

Type
Research Article
Information
MRS Bulletin , Volume 26 , Issue 7: Emerging Methods for Micro- and Nano-Fabrication Nanofabrication , July 2001 , pp. 512 - 517
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Chou, S.Y., Krauss, P.R., and Renstrom, P.J., Appl. Phys. Lett. 67 (1995) p. 3114; Science 272 (1996) p. 85.CrossRefGoogle Scholar
2.Haisma, J., Verheijen, M., van der Heuvel, K., and Berg, J. van der, J. Vac. Sci. Technol., B 14 (1996) p. 4124.CrossRefGoogle Scholar
3.Ruchhoeft, P., Colburn, M., Choi, B., Nounu, H., Johnson, S., Bailey, T., Damle, S., Stewart, M., Ekerdt, J., Sreenivasan, S.V., Wolfe, J.C., and Wilson, C.G., J. Vac. Sci. Technol., B 17 (1999) p.2965.CrossRefGoogle Scholar
4.Kumar, A. and Whitesides, G.M., Appl. Phys. Lett. 63 (1993) p. 2002.CrossRefGoogle Scholar
5.Chou, S.Y., Krauss, P.R., Zhang, W., Guo, L., and Zhuang, L., J. Vac. Sci. Technol., B 15 (1997) p. 2897.CrossRefGoogle Scholar
6.Li, M., Chen, L., Zhang, W., and Chou, S.Y., Appl. Phys. Lett. 78 (21) (2001) p. 3322.CrossRefGoogle Scholar
7.Sun, X., Zhuang, L., Zhang, W., and Chou, S.Y., J. Vac. Sci. Technol., B 16 (1998) p. 3922.CrossRefGoogle Scholar
8.Zhang, W. and Chou, S.Y., “Multilevel Nanoimprint Lithography with Submicron Alignment on 4“ Wafers,” presented at the 44th Int. Conf. on Electron, Ion and Photo Beam Technology and Fabrication (EIPBN), Palm Springs, CA, May 30–June 2, 2000.Google Scholar
9.Pease, F.R.W. (unpublished); Smith, H.I. (unpublished).Google Scholar
10.Tan, H., Gilbertson, A., and Chou, S.Y., J. Vac. Sci. Technol., B 16 (1998) p. 3926.CrossRefGoogle Scholar
11.Li, M.T., Wang, J., Zhuang, L., and Chou, S.Y., Appl. Phys. Lett. 76 (2000) p. 673.CrossRefGoogle Scholar
12.Yu, Z.H., Schablitsky, S.J., and Chou, S.Y., Appl. Phys. Lett. 74 (1999) p. 2381.CrossRefGoogle Scholar
13.Wu, W., Cui, B., Sun, X.Y., Zhang, W., Zhuang, L., and Chou, S.Y., J. Vac. Sci. Technol., B 16 (1998) p. 3825.CrossRefGoogle Scholar
14.Wang, J., Schablitsky, S., Yu, Z., Wu, W., and Chou, S.Y., J. Vac. Sci. Technolm., B 17 (1999) p. 2957.CrossRefGoogle Scholar
15.Yu, Z.H., Deshpande, P., Wu, W., Wang, J., and Chou, S.Y., Appl. Phys. Lett. 77 (2000) p. 927.CrossRefGoogle Scholar
16.Wang, J., Sun, X.Y., Chen, L., and Chou, S.Y., Appl. Phys. Lett. 75 (1999) p. 2767.CrossRefGoogle Scholar
17.Kamins, T.I., Ohlberg, D.A.A., Williams, R.S., Zhang, W., and Chou, S.Y., Appl. Phys. Lett. 74 (1999) p. 1773.CrossRefGoogle Scholar
18.Wang, J., Sun, X.Y., Chen, L., Zhuang, L., and Chou, S.Y., Appl. Phys. Lett. 76 (1999) p. 166.Google Scholar
19.Chou, S.Y. and Zhuang, L., J. Vac. Sci. Technol., B 17 (1999) p. 3197.CrossRefGoogle Scholar
20.Chou, S.Y., Zhuang, L., and Guo, L.J., Appl. Phys. Lett. 75 (7) (1999) p. 1004.CrossRefGoogle Scholar
21.He, L. and Chou, S.Y., to be published.Google Scholar
22.Deshpande, P., Chen, L., He, L., and Chou, S.Y., “Concentric Ring Patterns in Polymer Films Formed by Lithographically-Induced Self-Assembly,” presented at the 44th Int. Conf. on Electron, Ion and Photo Beam Technology and Fabrication (EIPBN), Palm Springs, CA, May 30–June 2, 2000.Google Scholar
23.Deshpande, P., Sun, X., Chen, L., and Chou, S.Y., to be published.Google Scholar
24.Zhuang, L., He, L., and Chou, S.Y., to be published.Google Scholar
25.He, L. and Chou, S.Y., to be published.Google Scholar