Chemical Vapor Deposition for Microelectronics: Principles, Technology and ApplicationsArthur Sherman (Noyes Publications, 1987)

Pauline Ho

doi:10.1557/S0883769400064046

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Chemical Vapor Deposition for Microelectronics: Principles, Technology and ApplicationsArthur Sherman (Noyes Publications, 1987)

Published online by Cambridge University Press: 29 November 2013

Pauline Ho

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Type: Book Reviews
Information: MRS Bulletin , Volume 13 , Issue 11 , November 1988 , pp. 78

DOI: https://doi.org/10.1557/S0883769400064046 [Opens in a new window]
Copyright: Copyright © Materials Research Society 1988

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Chemical Vapor Deposition for Microelectronics: Principles, Technology and ApplicationsArthur Sherman (Noyes Publications, 1987)

Volume 13, Issue 11
Pauline Ho
DOI: https://doi.org/10.1557/S0883769400064046

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Chemical Vapor Deposition for Microelectronics: Principles, Technology and ApplicationsArthur Sherman (Noyes Publications, 1987)

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