Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Bandić, Zvonimir Z.
Litvinov, Dmitri
and
Rooks, M.
2008.
Nanostructured Materials in Information Storage.
MRS Bulletin,
Vol. 33,
Issue. 9,
p.
831.
Jung, Yeon Sik
and
Ross, Caroline A.
2009.
Well‐Ordered Thin‐Film Nanopore Arrays Formed Using a Block‐Copolymer Template.
Small,
Vol. 5,
Issue. 14,
p.
1654.
Goll, Dagmar
2009.
Magnetism of nanostructured materials for advanced magnetic recording.
International Journal of Materials Research,
Vol. 100,
Issue. 5,
p.
652.
Chen, Wei
Park, Soojin
Wang, Jia-Yu
and
Russell, Thomas P.
2009.
Fabrication of Nanoporous Block Copolymer Thin Films through Mediation of Interfacial Interactions with UV Cross-Linked Polystyrene.
Macromolecules,
Vol. 42,
Issue. 18,
p.
7213.
Saavedra, Héctor M
Mullen, Thomas J
Zhang, Pengpeng
Dewey, Daniel C
Claridge, Shelley A
and
Weiss, Paul S
2010.
Hybrid strategies in nanolithography.
Reports on Progress in Physics,
Vol. 73,
Issue. 3,
p.
036501.
Fischer, Peter
2010.
Viewing spin structures with soft X-ray microscopy.
Materials Today,
Vol. 13,
Issue. 9,
p.
14.
Hellwig, O.
Bosworth, J. K.
Dobisz, E.
Kercher, D.
Hauet, T.
Zeltzer, G.
Risner-Jamtgaard, J. D.
Yaney, D.
and
Ruiz, R.
2010.
Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution.
Applied Physics Letters,
Vol. 96,
Issue. 5,
Farrell, Richard A.
Petkov, Nikolay
Morris, Michael A.
and
Holmes, Justin D.
2010.
Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices.
Journal of Colloid and Interface Science,
Vol. 349,
Issue. 2,
p.
449.
Liu, Guoliang
Kang, Huiman
Craig, Gordon S. W.
Detcheverry, Francois
de Pablo, Juan J.
Nealey, Paul F.
Tada, Yasuhiko
and
Yoshida, Hiroshi
2010.
Cross-sectional Imaging of Block Copolymer Thin Films on Chemically Patterned Surfaces.
Journal of Photopolymer Science and Technology,
Vol. 23,
Issue. 2,
p.
149.
Stoykovich, Mark P.
Daoulas, Kostas Ch.
Müller, Marcus
Kang, Huiman
de Pablo, Juan J.
and
Nealey, Paul F.
2010.
Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films.
Macromolecules,
Vol. 43,
Issue. 5,
p.
2334.
Xia, Guodong
Wang, Sumei
and
Jeong, Seong-Jun
2010.
A universal approach for template-directed assembly of ultrahigh density magnetic nanodot arrays.
Nanotechnology,
Vol. 21,
Issue. 48,
p.
485302.
Cheng, Joy Y.
Sanders, Daniel P.
Truong, Hoa D.
Harrer, Stefan
Friz, Alexander
Holmes, Steven
Colburn, Matthew
and
Hinsberg, William D.
2010.
Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist.
ACS Nano,
Vol. 4,
Issue. 8,
p.
4815.
Liu, Guoliang
Thomas, Carla S.
Craig, Gordon S. W.
and
Nealey, Paul F.
2010.
Integration of Density Multiplication in the Formation of Device‐Oriented Structures by Directed Assembly of Block Copolymer–Homopolymer Blends.
Advanced Functional Materials,
Vol. 20,
Issue. 8,
p.
1251.
Rodwogin, Marc D.
Spanjers, Charles S.
Leighton, C.
and
Hillmyer, Marc A.
2010.
Polylactide−Poly(dimethylsiloxane)−Polylactide Triblock Copolymers as Multifunctional Materials for Nanolithographic Applications.
ACS Nano,
Vol. 4,
Issue. 2,
p.
725.
Chen, Wei
Wang, Jia-Yu
Wei, Xinyu
Xu, Ji
Balazs, Anna C.
Matyjaszewski, Krzysztof
and
Russell, Thomas P.
2011.
UV-enhanced Ordering in Azobenzene-Containing Polystyrene-block-Poly(n-Butyl Methacrylate) Copolymer Blends.
Macromolecules,
Vol. 44,
Issue. 2,
p.
278.
Chen, Wei
Wei, Xinyu
Balazs, Anna C.
Matyjaszewski, Krzysztof
and
Russell, Thomas P.
2011.
Phase Behavior and Photoresponse of Azobenzene-Containing Polystyrene-block-poly(n-butyl methacrylate) Block Copolymers.
Macromolecules,
Vol. 44,
Issue. 5,
p.
1125.
Liu, Guoliang
Nealey, Paul F.
Ruiz, Ricardo
Dobisz, Elizabeth
Patel, Kanaiyalal C.
and
Albrecht, Thomas R.
2011.
Fabrication of chevron patterns for patterned media with block copolymer directed assembly.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena,
Vol. 29,
Issue. 6,
p.
06F204.
Craig, Gordon S. W.
and
Nealey, Paul F.
2011.
Generating Micro‐ and Nanopatterns on Polymeric Materials.
p.
199.
Si, Hua-Yan
Chen, Jing-Sheng
and
Chow, Gan-Moog
2011.
A simple method to prepare highly ordered PS-b-P4VP block copolymer template.
Colloids and Surfaces A: Physicochemical and Engineering Aspects,
Vol. 373,
Issue. 1-3,
p.
82.
Baruth, A.
Rodwogin, Marc D.
Shankar, A.
Erickson, M.J.
Hillmyer, Marc A.
and
Leighton, C.
2011.
Non-lift-off Block Copolymer Lithography of 25 nm Magnetic Nanodot Arrays.
ACS Applied Materials & Interfaces,
Vol. 3,
Issue. 9,
p.
3472.