Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-28T04:07:03.757Z Has data issue: false hasContentIssue false

Predictive and Descriptive Models for Transient Photoconductivity in Amorphous Oxide Semiconductors

Published online by Cambridge University Press:  22 August 2016

Jiajun Luo
Affiliation:
Electrical Engineering and Computer Science, Northwestern University, Evanston, IL 60208, U.S.A.
Matthew Grayson*
Affiliation:
Electrical Engineering and Computer Science, Northwestern University, Evanston, IL 60208, U.S.A.
*
Get access

Abstract

Amorphous oxide semiconductors (AOS) are important candidates for next generation display transistors, but instability under illumination with month-long transients is a significant drawback and may limit broader use. Several models have been developed to fit transient photoconductivity observed in AOS and relate it to a spectrum of weighted time constants, equivalent to either a density of states distribution of deep traps within the activated energy model, or to a time-dependent relaxation time constant in other models. In this work, we classify fits of the time constant spectrum to the transient data as either “descriptive” if they make no presumption about the spectral shape, or “predictive” if they assume a spectral shape a priori characterized by a few simple parameters. By fitting both descriptive and predictive models to simulated transients, it is observed that the best fit converges for the descriptive model if the measurement duration exceeds the mode (“peak”) value of the time constant distribution. The predictive models can converge orders of magnitude faster, but rely on a proper identification of the correct lineshape a priori. Therefore, it is recommended that first an unbiased descriptive model of sufficient measurement duration be performed. Then the known lineshape can be applied as a predictive model for future measurements, reducing subsequent measurement durations by orders of magnitude.

Type
Articles
Copyright
Copyright © Materials Research Society 2016 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Nomura, K., Ohta, H., Takagi, A., Kamiya, T., Hirano, M., and Hosono, H., Nature 432, 488 (2004).Google Scholar
Fortunato, E., Barquinha, P., and Martins, R., Adv. Mater. 24, 2945 (2012).Google Scholar
Park, J.S., Maeng, W.-J., Kim, H.-S., and Park, J.-S., Thin Solid Films 520, 1679 (2012).Google Scholar
Luo, J., Adler, A.U., Mason, T.O., Bruce Buchholz, D., Chang, R.P.H., and Grayson, M., J. Appl. Phys. 113, 153709 (2013).Google Scholar
Lee, D.H., Kawamura, K., Nomura, K., Kamiya, T., and Hosono, H., Electrochem. Solid-State Lett. 13, H324 (2010).Google Scholar
Yasuno, S., Kita, T., Morita, S., Kugimiya, T., Hayashi, K., and Sumie, S., J. Appl. Phys. 112, (2012).Google Scholar
Luo, J. and Grayson, M., MRS Proc. 1731, mrsf14 (2015).Google Scholar
Studenikin, S.A., Golego, N., and Cocivera, M., J. Appl. Phys. 84, 5001 (1998).Google Scholar
Nagase, T., Kishimoto, K., and Naito, H., J. Appl. Phys. 86, 5026 (1999).Google Scholar
Tsormpatzoglou, A., Hastas, N. a., Hatalis, M.K., and Dimitriadis, C. a., in 2014 29th Int. Conf. Microelectron. Proc. - MIEL 2014 (IEEE, 2014), pp. 269272.Google Scholar
Ghaffarzadeh, K., Nathan, A., Robertson, J., Kim, S., Jeon, S., Kim, C., Chung, U.-I., and Lee, J.-H., Appl. Phys. Lett. 97, 143510 (2010).Google Scholar
Flewitt, A.J. and Powell, M.J., J. Appl. Phys. 115, 134501 (2014).Google Scholar
Shlesinger, M.F., Annu. Rev. Phys. Chem. 39, 269 (1988).Google Scholar
Park, H.R., Liu, J.Z., and Wagner, S., Appl. Phys. Lett. 55, 2658 (1989).Google Scholar
Kakalios, J., Street, R.A., and Jackson, W.B., Phys. Rev. Lett. 59, 1037 (1987).CrossRefGoogle Scholar
Johnston, D.C., Phys. Rev. B 74, 1 (2006).CrossRefGoogle Scholar
Luo, J., Kim, S. D., and Grayson, M., in preparation, (2016).Google Scholar