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Formation of TiO2 Electrically Insulated Oxide Coatings in Mode of Alternating Current Application

Published online by Cambridge University Press:  20 June 2016

Sergey M. Karabanov*
Affiliation:
Ryazan State Radio Engineering University 59/1 Gagarina St., Ryazan390005, Russia
Dmitry V. Suvorov
Affiliation:
Ryazan State Radio Engineering University 59/1 Gagarina St., Ryazan390005, Russia
Gennady P. Gololobov
Affiliation:
Ryazan State Radio Engineering University 59/1 Gagarina St., Ryazan390005, Russia
Yulia M. Stryuchkova
Affiliation:
Ryazan State Radio Engineering University 59/1 Gagarina St., Ryazan390005, Russia
Maria A. Klyagina
Affiliation:
Ryazan State Radio Engineering University 59/1 Gagarina St., Ryazan390005, Russia
Evgeniy V. Slivkin
Affiliation:
Ryazan State Radio Engineering University 59/1 Gagarina St., Ryazan390005, Russia
*
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Abstract

The paper presents the research results of formation peculiarities of barrier electrically insulated coatings based on titanium oxide (TiO2) under conditions of AC-DC electrochemical anodizing. It is shown that overlapping of AC component (at the frequency of 100 kHz – 10 MHz) leads to formation of coatings 1.2-1.4 times thicker. Dependences of the coating thickness on frequency under various ratios of the AC-component amplitude to the DC-component of anodizing voltage have been obtained.

Type
Articles
Copyright
Copyright © Materials Research Society 2016 

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References

REFERENCES

Jeong, B.S., Norton, D.P. and Budai, J.D., Conductivity in Transparent Anatase TiO2 Films Epitaxially Grown by Reactive Sputtering Deposition, Solid-State Electronics 47 (2003), pp. 22752278 CrossRefGoogle Scholar
Ju, Y., Wang, M., Wang, Y., Wang, S. and Fu, C., Electrical Properties of Amorphous Titanium Oxide Thin Films for Bolometric Application, Advances in Condensed Matter Physics, Volume 2013 (2013)Google Scholar
Sima, C., Waldhauser, W., Lackner, J., Kahn, M., Nicolae, I., Viespe, C., Grigoriu, C. and Manea, A., Properties of TiO2 Thin Films Deposited by RF Magnetron Sputtering, Journal of optoelectronics and advanced materials, Vol. 9, No. 5, May 2007, pp. 14461449 Google Scholar
Firouzdor, V., Brechtl, J., Hauch, B., Sridharan, K. and Allen, T.R., Electrophoretic Deposition of Diffusion Barrier Titanium Oxide Coatings for Nuclear Reactor Cladding Applications, Applied Surface Science, Volume 282, 1 October 2013, pp. 798808 CrossRefGoogle Scholar
Gnedenkov, S.V., Khrisanova, O.A. and Zavidnaya, A.G., Plasma Electrolytic Oxidation of Metals and Alloys in Tartrate-Containing Solutions, ISBN: 978-5-8044-0885-6, Dalnauka 2008 Google Scholar
Marino, C.E.B, de Oliveira, E.M., Rocha-Filho, R.C. and Biaggio, S.R., On the Stability of Thin-Anodic-Oxide Films of Titanium in Acid Phosphoric Media, Corrosion Science 43 (8), pp. 14651476 Google Scholar
Krasicka-Cydzik, E., Electrochemical Aspects of Tailoring Anodic Layer Properties on Titanium Alloys, Corrosion Protection, XLII (1999), pp.4852 Google Scholar
Krasicka-Cydzik, E., Impedance Properties of Anodic Films Formed in H3PO4 on Selected Titanium Alloys, Mat. Eng. 7, 2 (2000), pp. 511 Google Scholar