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Corporate Responsibility: A Green Initiative to Reduce Chlorobenzene Based Chemistries in Semiconductor Processing

Published online by Cambridge University Press:  15 January 2019

Monique J. Farrell ,
Kevin Frey  and
John Mason
Monique J. Farrell*
Affiliation:
Northrop Grumman Corporation, PO Box1521, Baltimore, MD, USA
Kevin Frey
Affiliation:
Northrop Grumman Corporation, PO Box1521, Baltimore, MD, USA
John Mason
Affiliation:
Northrop Grumman Corporation, PO Box1521, Baltimore, MD, USA
*
*(Email: [email protected])
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Abstract

Climate change and an increase in endangered species, are examples of technological advances negatively impacting the environment. As technology demands increase, an earnest effort to reduce the environmental impact of processing and manufacturing related activities is critical. From a business perspective, minimizing or removing toxic process chemicals is a high impact area that can increase work environment safety and decrease waste management costs. This work presents processing considerations when transitioning to greener alternative polymer resist solvents, for applications in nanomanufacturing with sustainability considerations. Within government contracting, process modifications that change product form, fit, or function require qualification and at minimum justification. This work presents the conversion from a chlorobenzene to anisole based solvent using a 495 kMW polymetheyl methacrylate polymer resin, without impacting form fit or function of the intended device. Resist conversion is of interest as the difference in the substituents of the two solvents, impact the effective toxicity of the polymer resists. Specifically, the oral median lethal dose (LD50) in rats for chlorobenzene is 1110 mg/kg, while anisole is 3700 mg/kg. Therefore, developing a process utilizing anisole and replacing chlorobenzene addresses safety concerns and contributes to green initiatives worldwide. Within this work electron beam lithography fabricated transistor components consisting of a double layered source, and gate were converted from a chlorobenzene to anisole based process; while maintaining process of record specifications. The purpose of this work is to provide a starting platform for individuals seeking to convert from a chlorobenzene solvent to an anisole based resist for sub-micron lithography steps.

Keywords

polymersemiconductingdevicesthin filmcoating
Type
Articles
Information
MRS Advances , Volume 4 , Issue 7: Nanomaterials , 2019 , pp. 393 - 398
Copyright
Copyright © Materials Research Society 2019 

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References

REFERENCES

Leong, M., Doris, B., Kedzierski, J., Rim, K. and Yang, M., Science 306 (5704), 2057-2060 (2004).Google Scholar
Yamauchi, N., J Hajjar, J.-J., and Reif, R., IEEE 38 (1), 55-60 (1991).Google Scholar
Bohr, M. T., 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM) (2018).Google Scholar
Poliakoff, M., Licence, P. and George, M., Angew. Chem. Int. Ed. 57, 12590-12591 (2018).CrossRefGoogle Scholar
Oosterhout, S., Savikhin, V., Burgers, M. Zhang, J., Zhang, Y., Marder, S., Bazan, G., and Toney, M., J. Phys. Chem. C 122(20), 11136-11144 (2018).CrossRefGoogle Scholar
Takei, S., Proc. Vol. SPIE 10584, Novel Patterning Technologies 2018 1058414, (2018).Google Scholar
Papathomas, K. I. and Bhatt, A. C., Journal of Applied Polymer Science 59(13), 2029-2037 (1996).3.0.CO;2-J>CrossRefGoogle Scholar
MacLeod, M. and Mackay, D., Chemosphere 38(8), 1777-1796 (1999).CrossRefGoogle Scholar
Feltens, R., Mögel, I., Röder-Stolinski, C., Simon, J-C., Herberth, G. and Lehmann, I., Toxicology and Applied Pharmacology 242(1), 100-108 (2010).CrossRefGoogle Scholar
Chlorobenzene ICSC: 0642 – MSDS (2015). Available at https://www.cdc.gov/niosh/ipcsneng/neng0642.html (Accessed 19 October 2018)Google Scholar
Anisole ICSC: 1014 – MSDS (2015). Available atGoogle Scholar
https://www.cdc.gov/niosh/ipcsneng/neng0642.html (Accessed 19 October 2018)Google Scholar
Q3C — Tables and List Guidance for Industry (2018). Available athttps://www.fda.gov/downloads/drugs/guidances/ucm073395.pdf (Accessed 19 October 2018)Google Scholar